Liquid Film Formation on a Rotating Disk (Numerical Analysis at the Initial Stage)

Matsumoto, Yoichiro; Ohara, Taku; Teruya, Isao; Ohashi, Hideo

doi:10.1299/jsmeb1988.32.1_52

Cited by 8 publications

(6 citation statements)

References 7 publications

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“…ω << µ/ρh 2 (12) where µ is the viscosity of liquid and h is the film thickness. In practice this means that for a fluid of ρ = 1.0 g/cm 3 , µ = 10 g/(m-s), and h around 120 µm, ω must be much less than 6945 rpm.…”

Section: Resultsmentioning

confidence: 99%

“…[7][8][9] Many mathematical models were also developed to analyze the time-varying behavior of spin coating flows; however, initial film thickness contours were required. [10][11][12][13][14][15][16][17] In the real spin coating process utilized by the microelectronics industry, the photoresist or polyimide is injected onto a high speed rotating wafer. Only after the film has spread over the entire disk can the initial film thickness contours required by the above investigators be obtained.…”

Section: Reduction Of Photoresist Usage During Spin Coatingmentioning

confidence: 99%

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Reduction of photoresist usage during spin coating

Chou

Wang

Gong

et al. 2001

Journal of Elec Materi

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Section: Resultsmentioning

confidence: 99%

Section: Reduction Of Photoresist Usage During Spin Coatingmentioning

confidence: 99%

Reduction of photoresist usage during spin coating

Chou

Wang

Gong

et al. 2001

Journal of Elec Materi

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“…They established the basic mechanisms of thread and drop formation by rotating discs. Matsumoto et al 8 analysed the initial stage of the unsteady film formation process by solving the full Navier Stokes equations and showing the initial pattern of film flow on a rotating disc. Bruin 9 analysed the radial, tangential and meridional velocity profiles in a liquid film flowing over a rotating conical disc, and the velocity profiles were obtained through a complex function method with high accuracy.…”

Section: Introductionmentioning

confidence: 99%

Numerical study on film disintegration by centrifugal atomisation using rotating cup

Liu

Qin

2013

Powder Metallurgy

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Centrifugal atomisation of liquid or melts using a rotating cup is an efficient process that is widely used in many industrial processes, which range from chemical reactors to powder production in metallurgy. The theoretical prediction of liquid drop or particle size is desirable for the design of atomisers and operating parameters. In this paper, film disintegration by centrifugal atomisation using a rotating cup was analysed based on wave theory. Two mathematical models were proposed to predict the maximum unstable growth rate, wave length, film length, break-up time and drop size for the rotating cup at high and low Weber number respectively. The film break-up length and drop size were calculated numerically and agreed with the experimental results very well in film disintegration. In addition, the effects of the atomisation parameters in the film disintegration were discussed. The mathematical models are able to accurately predict the atomisation parameters.

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“…With an objective of obtaining a numerical solution of the film flow on a rotating disk for a wide range of Reynolds numbers and spin-up protocols, Rehg and Higgins (1988) have solved the self-similar form of the Navier-Stokes equations under planar interface assumption and have characterized the import of inertia and disk acceleration on film thinning rates. Matsumoto et al (1989) have solved the unsteady problem of film flow on a rotating disk numerically for a non-planar interface model. Reisfeld et al (1991) have examined the flow of a thin liquid film on a rotating disk, subject to centripetal and inertial forces, surface tension, gravity and constant mass transfer at the free surface and have obtained the conditions for film instability in several regions of interest using linear stability theory.…”

Section: Introductionmentioning

confidence: 99%