2018
DOI: 10.1088/1361-6528/aac032
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Local Schottky contacts of embedded Ag nanoparticles in Al2O3/SiNx:H stacks on Si: a design to enhance field effect passivation of Si junctions

Abstract: This paper describes an original design leading to the field effect passivation of Si n-p junctions. Ordered Ag nanoparticle (Ag-NP) arrays with optimal size and coverage fabricated by means of nanosphere lithography and thermal evaporation, were embedded in ultrathin-AlO/SiN :H stacks on the top of implanted Si n-p junctions, to achieve effective surface passivation. One way to characterize surface passivation is to use photocurrent, sensitive to recombination centers. We evidenced an improvement of photocurr… Show more

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Cited by 6 publications
(4 citation statements)
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“…One ALD cycle deposited one monolayer which equals to 0.12 nm. Junctions without alumina ( d = 0), i.e., with unpassivated metal-silicon contacts, have been realized, but the PCE is very low, only 0.4% [9]. The alumina deposition was carried out in a PICOSUN R200 system through a thermal process.…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…One ALD cycle deposited one monolayer which equals to 0.12 nm. Junctions without alumina ( d = 0), i.e., with unpassivated metal-silicon contacts, have been realized, but the PCE is very low, only 0.4% [9]. The alumina deposition was carried out in a PICOSUN R200 system through a thermal process.…”
Section: Methodsmentioning
confidence: 99%
“…ALD allows a good control of the thickness down to atomic scale, while the use of alumina leads to a good chemical passivation of interface states as well as to an efficient field effect passivation through localized charges in the oxide layer [8]. For example, Elmi et al showed that the introduction of embedded Ag nanoparticles in a thin alumina layer can effectively enhance the field effect passivation [9]. It is known that the sign and the density of the localized charges as well as the thickness of alumina layer are important parameters for surface passivation.…”
Section: Introductionmentioning
confidence: 99%
“…The height and periodicity of the nanopillars in the Si mould are optimized for realizing the minimal ambient reflection by the ST-OSCs. The fabrication process of the photonic-structured Si mould is described in our previous works [48][49][50] and illustrated in Figure S9, Supporting Information. An inverted polydimethylsiloxane (PDMS) photonic-structured AR coating formed on the Si mould was carefully peeled-off and attached on the glass side of the ST-OSCs.…”
Section: St-oscs With a 2-d Photonic-structured Ar Coatingmentioning
confidence: 99%
“…An effective method is to use the low-temperature atomic layer deposition (ALD) processing, taking its unique advantage of precise thickness control, excellent conformal and pin-hole free coverage ability [23,24]. Indeed, ALD deposited metal oxide films are usually introduced in commercial silicon based solar cell production, whereas there are few literatures about the OODs using this method [25,26].…”
Section: Introductionmentioning
confidence: 99%