2017
DOI: 10.1016/j.apsusc.2016.10.134
|View full text |Cite
|
Sign up to set email alerts
|

Low-cost laser printable photomask: One-step, photoresist-free, fully solution processed high-grade photolithography mask

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
7
0

Year Published

2018
2018
2022
2022

Publication Types

Select...
8

Relationship

2
6

Authors

Journals

citations
Cited by 13 publications
(7 citation statements)
references
References 24 publications
0
7
0
Order By: Relevance
“…Even if the pattern resolution of the submicron level has been reported using a femtosecond laser, the pattern resolution of 10 μm reported herein is noteworthy because the fabrication of high-resolution thin microelectrodes on a rough and uneven surface is a challenging task as a first attempt. Previously reported studies have focused on improving the processing performances, such as patterning resolution, processing speed, electrical conductivity, etc., on smooth surfaces, such as glass and polymer films (Supporting Information 4). Furthermore, the CW laser source of 1070 nm wavelength used herein is more accessible than visible wavelength lasers or ultrashort pulse lasers in other studies. , To evaluate the uniformity of the electrode, a microscopic image was taken, and the width on the five points of every electrode line was measured (Supporting Information 5).…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…Even if the pattern resolution of the submicron level has been reported using a femtosecond laser, the pattern resolution of 10 μm reported herein is noteworthy because the fabrication of high-resolution thin microelectrodes on a rough and uneven surface is a challenging task as a first attempt. Previously reported studies have focused on improving the processing performances, such as patterning resolution, processing speed, electrical conductivity, etc., on smooth surfaces, such as glass and polymer films (Supporting Information 4). Furthermore, the CW laser source of 1070 nm wavelength used herein is more accessible than visible wavelength lasers or ultrashort pulse lasers in other studies. , To evaluate the uniformity of the electrode, a microscopic image was taken, and the width on the five points of every electrode line was measured (Supporting Information 5).…”
Section: Resultsmentioning
confidence: 99%
“…Previously reported studies have focused on improving the processing performances, such as patterning resolution, processing speed, electrical conductivity, etc., on smooth surfaces, such as glass and polymer films (Supporting Information 4). Furthermore, the CW laser source of 1070 nm wavelength used herein is more accessible than visible wavelength lasers or ultrashort pulse lasers in other studies. , To evaluate the uniformity of the electrode, a microscopic image was taken, and the width on the five points of every electrode line was measured (Supporting Information 5). The average pattern width and standard deviation were 9.81 and 0.99 μm, respectively.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…This is attributed to the different laser wavelengths used. The surface became smoother when the wavelength increased, since both the growth sintering interaction and organic evaporation progress in a more stable manner due to the relatively low absorption property of longer wavelength. ,, Therefore, irradiating a laser with a 1070 nm wavelength on the hybrid suspension is suitable for achieving an optically smooth surface according to the laser sintering of hybrid suspension . However, the scanning rate of the typical laser sintering method using a 1070 nm wavelength is limited to 25 mm/s; otherwise, the LSL method improves the scan rate and sintering efficiency because shorter wavelength leads to higher laser absorption by the hybrid suspension.…”
Section: Resultsmentioning
confidence: 99%
“…The typical cost of the mask fabrication is rather affordable, depending on the resolution and can vary between USD 100 and USD 1000. The mask could be produced much more cheaply [ 42 , 43 ] if a m resolution is not crucial.…”
Section: Discussionmentioning
confidence: 99%