2021
DOI: 10.1002/adfm.202170294
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Low Power MoS2/Nb2O5 Memtransistor Device with Highly Reliable Heterosynaptic Plasticity (Adv. Funct. Mater. 40/2021)

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Cited by 19 publications
(23 citation statements)
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“…Furthermore, stimulated by 0.5 V electrical voltage pulse (with the PSC less than 1.2 × 10 –10 A), the operating power of our electronic synapse can be less than 60 pW, which is lower than that of many 2D materials‐based synapses. [ 44,45 ] The results imply that our device is promising for low‐power applications in neuromorphic computing. Thus, we can make use of a 2D layered BiOI nanosheet to achieve a low‐power memristor and low‐power electronic synapse based on the mechanism as discussed above, and expect to further construct low‐power memory and a neuromorphic system.…”
Section: Resultsmentioning
confidence: 91%
“…Furthermore, stimulated by 0.5 V electrical voltage pulse (with the PSC less than 1.2 × 10 –10 A), the operating power of our electronic synapse can be less than 60 pW, which is lower than that of many 2D materials‐based synapses. [ 44,45 ] The results imply that our device is promising for low‐power applications in neuromorphic computing. Thus, we can make use of a 2D layered BiOI nanosheet to achieve a low‐power memristor and low‐power electronic synapse based on the mechanism as discussed above, and expect to further construct low‐power memory and a neuromorphic system.…”
Section: Resultsmentioning
confidence: 91%
“…For example, a Nb 2 O 5 interfacial layer between the MoS 2 channel and the Al 2 O 3 gate dielectric was used to create a larger Schottky barrier, resulting in improved linearity and an increased number (>200) of distinct conductance states. [ 131 ]…”
Section: Memtransistor Materials Mechanisms and Architecturesmentioning
confidence: 99%
“…The development of 2D materials in the field of memristors has a long history due to the characteristics that are beneficial to the resistance switching behaviors, such as large specific surface area, adjustable band‐gap, and high mobility. [ 165–167 ] A large number of researchers have found the resistive switching behavior in 2D materials, such as graphene and its derivatives, [ 128,168,169 ] molybdenum disulfide, [ 170,171 ] tungsten disulfide, [ 172,173 ] and hexagonal boron nitride, [ 174,175 ] while the 2D materials are not performed in photonic memristive devices until its concept is proposed in recent years. Even though there are many methods to prepare 2D materials, such as mechanical peel‐off, chemical vapor deposition and sol–gel process, the performances of the 2D materials prepared by various methods are different in memristor due to the limitations of the preparation conditions, which means that the optimization potential of the same 2D material in the photonic memristive and memristive‐like devices is enormous.…”
Section: Active Materials For Photonic Memristive and Memristive‐like...mentioning
confidence: 99%