Low-pressure chemical vapour deposition of mullite layers using a cold-wall reactor

Armas, B.; Sibieude, F.; Mazel, A.; Fourmeaux, R.; Icaza-Herrera, Miguel de

doi:10.1016/s0257-8972(01)01132-x

Cited by 8 publications

(5 citation statements)

References 25 publications

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“…This observation is in good agreement with reports for EB-PVD films deposited below 700 °C [36] and crystalline thin films deposited at temperatures higher than 1000 °C by CVD. [25,[30][31][32][33][34][35]40] Only peaks of the substrate were identified after heat treatment at both 700 °C and 900 °C for 1 h (Figures S2 and S3). Peaks associated with transition alumina or silica phases, commonly identified in diphasic sol-gel routes, [41,42] were not found in our samples.…”

Section: Phase Identificationmentioning

confidence: 99%

“…XRD analyses of the mullite-coated Al 2 O 3 inverse opals (photonic crystals) presented peaks related to the mullite phase when heat treated at 1100 °C for 1 h (Figure 7) Mullite conversion temperature according to the mixing homogeneity scale, related to the processing route a) monophasic sol-gels (type I), [28,[57][58][59] (a′) monophasic nanoparticulate sol-gel, [60] b) CVD, [30,35] c) EB-PVD with layer thickness ≈2 nm, [36] (c′) EB-PVD with layer thickness ≈9 nm, [36] d) diphasic sol-gel (type II), [28,41,42,61] e) powder metallurgy + sol-gel (coated powders), [28,62,63] and f) powder metallurgy. [43] The symbol ♦ indicates atomic layer deposition (result from this study).…”

Section: Photonic Crystal Stabilitymentioning

confidence: 99%

“…CVD deposition of mullite films has already been demonstrated using AlCl 3 -SiCl 4 -CO 2 -H 2 [25,[30][31][32][33][34] and AlCl 3 -SiCl 4 -N 2 O [35] as precursors. Similar coatings have also been deposited by electron beam physical vapor deposition (EB-PVD) [36] and plasma spraying.…”

Section: Introductionmentioning

confidence: 99%

“…Similar coatings have also been deposited by electron beam physical vapor deposition (EB-PVD) [36] and plasma spraying. [37] However, all those processes have been performed at considerable high temperatures, ranging from 600 °C [36] for PVD up to 1200 °C in CVD [35] and even higher (>1800 °C) for plasma spraying process. This characteristic makes those processes unviable for deposition onto polymeric sacrificial templates, which have been studied and commonly used for self-assembly of opals.…”

Section: Introductionmentioning

confidence: 99%

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Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications

Furlan

Krekeler

Ritter

et al. 2017

Adv Materials Inter

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coatings on geometrically complex substrates, [2][3][4] such as anodic aluminum oxide membranes, aerogels, photonic crystals, and nanorods, with a film thickness control on the Å-scale. Additionally, by combining two or more binary ALD processes in a super cycle ALD process, multicomponent materials can be achieved, such as nanolaminates, doped thin films, and ternary or quaternary oxides. [5] The ability of compositional control of thin films at an atomic level provides the possibility for development of tailor-made atomically mixed systems, pointing to novel materials functionalities.Direct and inverse opals are examples of photonic crystals, which can be manufactured by colloidal self-assembly [6,7] and ALD. [8,9] Its high ordered porosity of interconnects is attractive for a variety of technological applications, such as porous membranes, catalysts, solid oxide fuel cells, and photonics applications. [10][11][12] The 3D periodic arrangement of pores provides a photonic bandgap to these artificial materials, which prohibits the transmission and hence leads to a reflection of electromagnetic radiation in spectral range which is determined by the materials' properties. Specifically, the radiation wavelength, which will be reflected, is influenced by the material microstructure assemble, mono-or multistacked, and also the macropore size. [8,9,[13][14][15] This selective behavior in transmission and reflection might pave the way to effective solar thermo photovoltaic energy conversion devices [16,17] and also next-generation thermal barrier coatings.However, retention of the 3D structure for high-temperature applications remains a significant challenge. [10,18] As the length scales in these porous materials are decreased, as higher is the surface area and specific activity. When exposed to high temperatures, the material's structure may suffer from detrimental morphological changes, such as extensive grain growth, distortion, and eventually destruction of the total periodically organized structure. [9,10] Therefore, this material needs to not only interact with electromagnetic radiation but also have structural stability and keep its function up to high temperatures (usually higher than 1000 °C). The latter fact could be addressed by coating the substrate material with a ceramic oxide that is stable at high temperatures, either by chemical vapor deposition (CVD) [19] or ALD [20] processes.Herein, mullite has been chosen: A ceramic material, which is well known for its stability at high-temperature environments, Atomic layer deposition (ALD) process presents thickness control in an Ång-strom scale due to its inherent surface self-limited reactions. In this work, an ALD super cycle approach, where a superposition of nanolaminates of SiO 2 and Al 2 O 3 is generated by cycling the precursors APTES-H 2 O-O 3 and TMA-H 2 O, is used to deposit thin films with varying ratio of Al 2 O 3 :SiO 2 into silicon wafers and into inverse photonic crystals. The resulting ternary oxide films deposited at low temperature (150 °C) ar...

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Section: Phase Identificationmentioning

confidence: 99%

Section: Photonic Crystal Stabilitymentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications

Furlan

Krekeler

Ritter

et al. 2017

Adv Materials Inter

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show abstract

“…For example, a mixture of solids, a mixture of sols, or a mixture of sol and salts can each be used as the starting materials. Similarly, a variety of mullite preparation methods has been developed such as reaction sintering of mechanically mixed powders [7][8][9][10][11], hydrothermal treatment of mixtures of sols [12][13][14] and chemical vapour deposition [15][16][17][18]. On the other hand, different routes have been used for manufacturing of zirconia-mullite composites from mullite-zirconia or alumina-zircon mixture such as plasma spray using plasma arc [19][20][21], reaction sintering at elevated temperatures [22][23][24][25][26], crystallization of rapidly quenched melts of ZrO 2 -Al 2 O 3 -SiO 2 [27] and liquid infiltration technique [28].…”

Section: Introductionmentioning

confidence: 99%