2021
DOI: 10.1016/j.ceramint.2021.04.050
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Low-temperature and high-performance ZnSnO thin film transistor activated by lightwave irradiation

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Cited by 19 publications
(23 citation statements)
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“…6) and subsequently leads to a higher electron concentration. 20 The above evidence explains the higher μ and lower V th of the Z/S/Z TFT compared with those of the Z/Z/Z TFT. A high-performance TFT is successfully fabricated using the Z/S/Z stacked semiconductor layer.…”
Section: Resultsmentioning
confidence: 83%
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“…6) and subsequently leads to a higher electron concentration. 20 The above evidence explains the higher μ and lower V th of the Z/S/Z TFT compared with those of the Z/Z/Z TFT. A high-performance TFT is successfully fabricated using the Z/S/Z stacked semiconductor layer.…”
Section: Resultsmentioning
confidence: 83%
“…The corresponding crystalline phases are rutile structures of SnO 2 (110), (101) and (211) phases. 20,65,66 The grain size of the (110) phase calculated using the Scherrer equation is 11.3 nm. 67 The S/S/S layer shows a polycrystalline structure.…”
Section: Resultsmentioning
confidence: 99%
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“…Tin dioxide has been attracting scientific attention all over the world for decades, both as an individual material [1][2][3][4] and as a component of more complex substances, especially transparent electrodes, including ITO [5,6], SnGaO [7], ZnSnO (ZTO) [8,9], SnO 2 :F (FTO) [10], Al-Sn-Zn-O (ATZO) [11], SnO 2 @N [12] and others. This material is a wide-bandgap semiconductor (E g ~3.…”
Section: Introductionmentioning
confidence: 99%