2017
DOI: 10.1016/j.ceramint.2017.02.006
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Low-temperature conducting performance of transparent indium tin oxide/antimony tin oxide electrodes

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Cited by 31 publications
(12 citation statements)
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“…ITO was successfully formed by doping Sn into In 2 O 3 , which is consistent with other studies. [26,27] Figure 3a,b shows AFM images of 100 nm ITO on the GaAs substrate. The average roughness (Ra) was 3.11 nm.…”
Section: Resultsmentioning
confidence: 99%
“…ITO was successfully formed by doping Sn into In 2 O 3 , which is consistent with other studies. [26,27] Figure 3a,b shows AFM images of 100 nm ITO on the GaAs substrate. The average roughness (Ra) was 3.11 nm.…”
Section: Resultsmentioning
confidence: 99%
“…For the other side, the EC materials with ion storage property complementary to that of the opposite side are used. The three‐layer structure of cathodic EC material/electrolyte/anodic EC material is covered by two transparent conducting oxides (TCO), such as F‐doped SnO 2 , Sn‐doped In 2 O 3 , and Sb‐doped SnO 2 , which could be electrically conductive and optically transparent . The operation of the ECDs is possible when ions are inserted or extracted in the EC materials via an electrolyte by applied voltage to transparent conducting layers.…”
Section: Electrochromic Devices (Ecds)mentioning
confidence: 99%
“…The three-layer structure of cathodic EC material/electrolyte/anodic EC material is covered by two transparent conducting oxides (TCO), such as F-doped SnO 2 , Sn-doped In 2 O 3 , and Sb-doped SnO 2 , which could be electrically conductive and optically transparent. [11][12][13] The operation of the ECDs is possible when ions are inserted or extracted in the EC materials via an electrolyte by applied voltage to transparent conducting layers. At this time, the electrons balance on charge of ion-containing EC materials; hence, they are strongly responsible for the performances of ECDs.…”
Section: Introductionmentioning
confidence: 99%
“…The best resistivity of ITO film deposited by sputtering was reported as low as 1.2 × 10 −4 Ω cm [70]. As an alternative to vacuum-based deposition, recently much efforts have been focused on production of solution-based deposition for high-performance ITO films using various approaches such as nanomaterials-based [71][72][73][74][75], aqueous metal salts solution [76], combustion synthesis [77,78], and advanced annealing techniques (microwave annealing [79] and ultraviolet laser annealing [80]. A summary of properties of ITO films prepared by various solution-based deposition processes is given in Table 3.…”
Section: Indium-tin-oxide (Ito)mentioning
confidence: 99%