2014
DOI: 10.12693/aphyspola.126.1174
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Low Temperature Processing of Nanostructures Based on II-VI Semiconductors Quantum Wells

Abstract: We report the rst results of electron beam lithography processes performed on polymethyl methacrylate (PMMA) and hydrogen silsesquioxane (HSQ) resists, which have been pre-backed in vacuum at T ≤ 90For such low temperature processing the lithographical resolution is reduced as compared to standard procedures, however, the exposure contrast and adhesion to CdTe and HgTe substrates have been sucient for the fabrication of sub-µm quantum devices. Furthermore, the new method of electrical microcontact forming is p… Show more

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Cited by 5 publications
(2 citation statements)
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“…In addition, samples S2 and S3 had a top gate electrode allowing for carrier density control. 42 Figure 2a, b shows the layer sequence scheme and highresolution electron microscopy (HREM) images of the cross section of sample S1. A perfect alignment of the successive atomic layers with the well-defined HgTe QW can be seen in Fig.…”
Section: Investigated Structuresmentioning
confidence: 99%
“…In addition, samples S2 and S3 had a top gate electrode allowing for carrier density control. 42 Figure 2a, b shows the layer sequence scheme and highresolution electron microscopy (HREM) images of the cross section of sample S1. A perfect alignment of the successive atomic layers with the well-defined HgTe QW can be seen in Fig.…”
Section: Investigated Structuresmentioning
confidence: 99%
“…Measurements were performed on lithographically defined Hall bars with the dimensions of L × W = 80 × 20 µm 2 , and L × W = 40 × 20 µm 2 (samples S1 and S2, respectively) and L × W = 650 × 50 µm 2 (sample S3 ). Additionally, samples S2 and S3 had a top gate electrode allowing for carrier density control [36].…”
Section: A Investigated Structuresmentioning
confidence: 99%