650 nm AIGalnP/GalnP laser diodes with compressively strained MQW active layer have been successfully fabricated by means of single epitaxy growth. The threshold current is 6.4 mA,at 40 mA OW operation ,the fundamental transverse-mode still remains, and the output power and the slope efficiency can reach 34 mW and 1.1 mW/mA respectively. The dead output power in OW operation can reach 66 mW at a saturation current of 88 mA. During 200 h burn in test, the laser diodes show good stabilization with a degradation of less than 8 %. CLC number.TN248.4 Document code:A Article ID:1673ID: -1905ID: (2006 Red laser diodes based on semiconductor material GaInP/A1GaInP have been extensively studied over the last ten years. It brings great commercial opportunities because of their super advantages, such as low power consumption, direct modulation, small size, reduced weight, high efficience, high reliability and etc. It is widely applied to laser pointer, DVD system, bar code scanner, industry measurement, and medical treatment E1' 27 . In addition,an emerging application to red laser diodes is in plastic optical fiber communication. It is very competitive to use them in short range fiber networks because of their low cost and long lifespan. Red laser diodes, used in hand pointer and industry measurement and powered by batteries, especially require low operating current.Compared with A1GaAs and InGaAsP material, The GaInP/A1GaInP semiconductor laser has two big problems: first, for the freed excitonic photons,it is very difficult to be constrained within the active layer of smaller conduction band offset, which mainly depends upon the laser characters, such as threshold current and output power. Furthermore, with poor heat dissipation, A1-GaInP material is hard to be operated at very high temperature.Generally,lasers with visible light and good performance are fabricated by multi-growth of metal-organic chemical vapor deposition E3-~j. However, the multigrowth would result in more complex factor and increased cost. Also the n-type blocking layer would increase threshold current and decrease slope efficiency due to the optical loss. In this letter, we fabricated the GaInP/A1GaInP semiconductor laser with compressively strained MQW active layer by single growth , at the * E-mail: xiaw@sdu, edu, cn same time, we optimized the growth condition, and implemented the cladding layer with high A1 composition and high p-type doping level. The fabricated laser diodes demonstrate the lowest threshold current of 6.4 mA at 652.4 nm compared with any ever reported, with more than 30 mW power output at room temperature by remaining fundamental transverse-mode. The structure of compressively strained multiple quantum-well laser was grown by low-pressure MOCVD which is made by EMCORE of America. The reactor is capable of growing six 2-inch wafers per run. The alkyl sources are trimethylgallium (TMGa), trimethylaluminum (TMA1) and trimethylindium (TMIn). The V group gases used are AsH3 and PH3 ;and the doping sources are Cpz Mg for the p-type la...