2010
DOI: 10.3176/eng.2010.1.04
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LPE technology for power GaAs diode structures

Abstract: Abstract.A liquid phase epitaxy technology for deposition of GaAs epilayers on the monocristallic GaAs substrates for high voltage ultra fast power p + -p-i-n-n + GaAs structures has been developed. Proposed technological and hardware solutions of the LPE allow high efficiency of the growing process of diode structures with prescribed ratings and high structural quality of epitaxial layers. A method and technology for the fabrication of GaAs dies for the nanosecond range with reverse voltage up to 1200 V and c… Show more

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Cited by 4 publications
(3 citation statements)
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“…However, despite a certain success, the results reached in improving the switching speed for power diodes based on Si or GaAs "homojunction" structures fail to fully satisfy the upto-date power electronics needs. The minimal switching time of about 30-50 ns was demonstrated for diodes with blocking voltage U b of about 400-600 V [13][14][15][16].…”
Section: A Fast Recovery Eepitaxial Diodes (Fred) For Pulsedmentioning
confidence: 99%
“…However, despite a certain success, the results reached in improving the switching speed for power diodes based on Si or GaAs "homojunction" structures fail to fully satisfy the upto-date power electronics needs. The minimal switching time of about 30-50 ns was demonstrated for diodes with blocking voltage U b of about 400-600 V [13][14][15][16].…”
Section: A Fast Recovery Eepitaxial Diodes (Fred) For Pulsedmentioning
confidence: 99%
“…This epitaxial growth offers the ability to create 120 µm thicker devices and thus to achieve blocking voltages higher than 1000 V. Nevertheless due to the technological limitations, it is challenging for engineers to grow pure and lightly doped intrinsic GaAs. Investigations on the interactions between the quartz reactor, vaporised oxygen, and molten gallium proved that the homogenisation process of the liquefied gallium only takes place before epitaxial growth, if the environment is additionally doped with Si atoms by adding vaporised oxygen into the gas environment [2, 5]. The equipment for the growth of the GaAs epitaxial layers is shown in Fig.…”
Section: Gallium Arsenide (Gaas) Properties and Technologymentioning
confidence: 99%
“…Typically the cost-competitive manufacturing technology uses the Liquid Phase Epitaxy (LPE) solution (e.g. [5][6][7]), and the analysis of electrical characteristics under different ambient conditions have been carried out using numerical experiments (e.g. [8][9]).…”
Section: Introductionmentioning
confidence: 99%