Magnetic Electrodeposits of Cobalt-Phosphorus

Sallo, J. S.; Carr, J. M.

doi:10.1149/1.2425232

Cited by 25 publications

(4 citation statements)

References 3 publications

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“…Investigation on several complexing agents ~or plating bath.--A perpendicular orientation of plated Co structure c-axis has been :discussed by several workers (11)(12)(13)(14), but no paper on perpendicular recording application has been reported in the field of plated magnetic films. 2 It was pointed out (9, 10) that the codeposition of W into Co alloy film makes the c-axis perpendicular to the substrate plane, and that the codeposition of Mn also makes the c-axis perpendicularity more effective and the Ms value for the film lower.…”

Section: Resultsmentioning

confidence: 99%

“…At the 0.04-0.05M MnSO4 concentration range, very high maximum values of over 2 kOe for perpendicular (• and over 1 kOe for parallel (//) coercJvity were obtained. For such a high coercivity in the case of plated film, electroplated film was reported to give over 1 kOe under perpendicular orientation conditions (14). The difference between these two values also gives a maximum at 0.04-0.05M MnSO4.…”

Section: Ercivity Hc(• and Hc(//) Increase With Increasingmentioning

confidence: 98%

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A Study on Electroless Plating of Cobalt Alloy Films for Perpendicular Recording

Osaka

Kasai

Koiwa

et al. 1983

J. Electrochem. Soc.

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An electroless plating bath for the preparation of perpendicular recording media was developed. It was found that the hcp structure of Co-P is oriented normal to the film plane with the Mn codeposition into the films. First, an ammoniacal malonate-malate bath, containing MnSO4, was selected. Nickel was codeposited into the films in order to decrease the saturation magnetization, Ms, since low Ms is necessary to decrease the demagnetizing field. Second, effects were investigated for three factors (i.e., MnSO4 concentration, bath p H, and NiSO4 concentration) causing the c-axis perpendicular orientation of the film properties. Optimum plating conditions for perpendicular recording media were thus determined. * Electrochemical Society Active Member. ABSTRACTThe effect of adenine, guanine, saccharin, and coumarin on electroless copper deposition has been studied by cyclic voltammetry and the weight gain method. It was found that guanine and adenine accelerate electroless copper deposition. Coumarin and saccharin have almost no effect on the deposition process. Differences in the effect of these two groups of additives have been correlated to differences in the electronic structure of molecules. * Electrochemical Society Active Member.is important in order to understand passivation phenomena in electroless copper deposition. ExperimentalGravimetric experiments.--Experiments were carried out in a glass beaker placed in a constant temperature bath regulated at 25~ (-----0.5). Approximately 500 ml of the electroless copper solution was used with the stainless steel plate sample of 30 cm 2' area. The steel plate samples were activated in PdC12 prior to immersion into the plating solution in order to avoid effects of the variable induction time (13). DUring plating, argon was passed above the solution. After 30 min of deposition, the steel plate was taken out of the solution, dried, and the amount of the deposited copper was determined by weighing.Electrochemical experiments.--The solutions were prepared with analytical grade reagents and deionized water. The electroless copper bath used for these ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 128.255.6.125 Downloaded on 2015-03-17 to IP

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Section: Resultsmentioning

confidence: 99%

Section: Ercivity Hc(• and Hc(//) Increase With Increasingmentioning

confidence: 98%

A Study on Electroless Plating of Cobalt Alloy Films for Perpendicular Recording

Osaka

Kasai

Koiwa

et al. 1983

J. Electrochem. Soc.

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“…Magnetic properties.--Saturation magnetization (~s) of as-deposited films (thickness is about 3000A) is between 30 and 50 emu/g, the remanence (~rr) approaches zero, and the coercivities (Hci) are lower than 50 Oe. These properties are almost independent of the sample preparation conditions, which is different from the Co-P system, whose properties are governed by pH, bath temperature, and concentration of reducing agents, and whose Hci reaches a value of 1000 Oe (26). The grain size of as-deposited films (60A) is far lower than the single-domain particle size of Co (370s and lies between the size of superparamagnetic and a single-domain.…”

Section: Resultsmentioning

confidence: 95%

The Microstructure and Magnetic Properties of Electroless‐Plated Co‐B Thin Films

Chang

Chen

Hung

et al. 1986

J. Electrochem. Soc.

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Cobalt‐boron alloy films were successfully prepared by electroless plating and characterized by AES, TEM, DSC, and VSM techniques. A bath suitable for room temperature electroless plating was developed. The plating rate was found to be dependent on pH , Co++ concentration, and bath temperature, while the composition of the deposited films was not. The microstructure of the as‐deposited films is characteristic of clusters of aggregating cells and was established to be amorphous with soft magnetic properties. After annealing at 300°C for 1h, the amorphous films were transformed to Co (hcp) phase. normalCoB , Co2B , Co (fcc), stacking faults, and twins were visible for the films subjected to annealing temperatures above 400°C. The saturation magnetization, remanence, and intrinsic coercivity of optimally annealed films are: σs=106 normalemu/normalg , σr=54 normalemu/normalg , and normalHci=250 normalOe . The possible mechanism of autocatalytic reactions, composition, and structure of the films as a function of preparation variables and the detailed transformation during annealing are also discussed.

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“…species confer the low grade to electrodeposits 12 (poor conductivity, rough surface, etc.). In other way and at microscopic scale (nanoparticles formation), it is reported that many properties (magnetic as good example) of thin films depend both on the orientation and grain size of the crystals 13,14 . In this work we show that structure and grain sizes of Co deposit depends greatly on the pH of electrolyte.…”

Section: Introductionmentioning

confidence: 99%