2021
DOI: 10.1016/j.jmmm.2021.168047
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Magnetocrystalline origin of the perpendicular magnetic anisotropy in Ga-poor FeGa thin films

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Cited by 5 publications
(4 citation statements)
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“…Composition values measured in the samples were consistently lower than the nominal composition of the targets. This Ga loss during the growth process has been previously reported [29,34,35] and was attributed to the growth kinetics [29,36]. The composition (x Film Fe , x Film Ga ) and thickness values of the samples are also summarized in Table I.…”
Section: Methodssupporting
confidence: 74%
See 1 more Smart Citation
“…Composition values measured in the samples were consistently lower than the nominal composition of the targets. This Ga loss during the growth process has been previously reported [29,34,35] and was attributed to the growth kinetics [29,36]. The composition (x Film Fe , x Film Ga ) and thickness values of the samples are also summarized in Table I.…”
Section: Methodssupporting
confidence: 74%
“…The hard axis is along the [010] Si direction, and it is characterized by a lower remanent magnetization and a smaller coercive field. It is interesting to note that, although the native Si oxide is amorphous, the anisotropy Fe-Ga axis aligns along one of the 100 crystallographic Si axes; this behavior was already observed for us in previous studies [29,35]. Finally, we have observed that the samples become more isotropic when we increase the sample temperature during the growth process, which is reflected by the fact that M r /M s and μ 0 H c do not present significant variations along the different in-plane directions, as shown in Fig.…”
Section: B Magnetic Structuresupporting
confidence: 73%
“…The composition values measured in the samples were consistently lower than the nominal composition of the targets. This loss of Ga during the growth process was previously reported [25,31,35] and attributed to growth kinetics [25,39]. For sputtered alloys, two possible mechanisms are proposed to explain the loss of Ga.…”
Section: Compositionsupporting
confidence: 75%
“…An in-plane uniaxial anisotropy is usually induced during deposition process and can be controlled by oblique deposition [29,30]. Furthermore, a uniaxial anisotropy perpendicular to the film can be induced as a result of interfacial effects or residual stresses [31]. The competition among magnetic anisotropies takes an important role in the magnetic commutation processes of films [32].…”
Section: Introductionmentioning
confidence: 99%