Making of P10-JOBDECK with OASIS and GDS-II fit for practical use

Mori, Masayoshi; Narukawa, Shogo; Yamazaki, Kiyoshi; Hosono, Kunihiro

doi:10.1117/12.729007

Cited by 1 publication

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“…It is no secret that nowadays the performance of electron beam exposure tools on the one hand depends on the functional capabilities of the writer itself, but on the other hand on the process technology applied or going with the lithography system and, last but not least, also on the possibilities offered by the layout data preparation software [4], [6], [7]. That is the reason why from the very beginning Jenoptik / Leica and now Vistec have focussed their activities on continuously developing and upgrading appropriate data preparation software packages and evaluating hardware solutions.…”

Section: Introductionmentioning

confidence: 99%

Latest results and computing performance of the ePLACE data preparation tool

et al. 2009

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At the EMLC 2009 in Dresden the data preparation package ePLACE was already presented. This package has been used for quite different applications covering mask write, direct write and special applications. In this paper we will disclose results achieved when using the ePLACE package for processing of layout data of immediate interest. During the evaluation phase of the new solution we could benefit from broad experience we collected over many years with the fracture performance of the MGS software, which is one core element of today's ePLACE package. A key interest of this paper is the investigation of the scalability of computing solutions as a cost-effective approach when processing huge data volumes with the new solution. This is reflected against current state-of-the-art data processing tasks being part of both mask write and direct write applications. Furthermore, we evaluated visualization and simulation possibilities of the ePLACE package with respect to its use with latest layouts in various applications. The improved performance of the data preparation package including its adaptation to new e-beam lithography options, as, for instance, the incorporation of the cell projection capability or the newly developed Multi Shaped Beam (MSB) technology, will be also discussed. As an example the matching of the data path with a Vistec SB3055 will be outlined. Processing of Design For E-Beam (DFEB) data (including cell contents) and their conversion to real exposure data is reported. The advantages of the parallel use of standard shaped beam und cell projection technologies are highlighted focussing on latest writing time yields achieved when applying the CP feature

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Section: Introductionmentioning

confidence: 99%