Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations

Hur, Jun-Gyu

doi:10.1364/ao.50.002383

Cited by 24 publications

(13 citation statements)

References 13 publications

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“…Due to the properties of the photoresist, the relationship between the exposure depth and the exposure dose is nonlinear, also. Some studies [ 28 , 29 ] have reported that the exposure depth is a logarithmic function of the dose and can be determined by the contrast curve, which is defined as the linear slope of the contrast curve as follows:

…”

Section: Experiments Setup and Methodsmentioning

confidence: 99%

Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography

et al. 2017

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A maskless lithography method to realize the rapid and cost-effective fabrication of micro-optics elements with arbitrary surface profiles is reported. A digital micro-mirror device (DMD) is applied to flexibly modulate that the exposure dose according to the surface profile of the structure to be fabricated. Due to the fact that not only the relationship between the grayscale levels of the DMD and the exposure dose on the surface of the photoresist, but also the dependence of the exposure depth on the exposure dose, deviate from a linear relationship arising from the DMD and photoresist, respectively, and cannot be systemically eliminated, complicated fabrication art and large fabrication error will results. A method of compensating the two nonlinear effects is proposed that can be used to accurately design the digital grayscale mask and ensure a precise control of the surface profile of the structure to be fabricated. To testify to the reliability of this approach, several typical array elements with a spherical surface, aspherical surface, and conic surface have been fabricated and tested. The root-mean-square (RMS) between the test and design value of the surface height is about 0.1 μm. The proposed method of compensating the nonlinear effect in maskless lithography can be directly used to control the grayscale levels of the DMD for fabricating the structure with an arbitrary surface profile.

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…”

Section: Experiments Setup and Methodsmentioning

confidence: 99%

Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography

et al. 2017

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show abstract

“…The digital lithography system could transfer customer design to digital signals, and make the digital mirror devices (DMD) array works like a mask to write patterns directly onto photoresist on substrates [1][2][3][4][5], which has great advantages in terms of mask-free for cost saving, improvement of production rates, and allows for rapid changes of the pattern on both rigid and flexible substrates, etc. [6][7].…”

Section: Objective and Backgroundmentioning

confidence: 99%

P‐178: Flexible AMOLED Display Fabricated by Mask‐less Digital Lithography Technology

Chen

Liou

Jung

et al. 2019

Symp Digest of Tech Papers

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“…Generally, the maskless lithography technique fabricates a 3D microstructure by the multilayer slicing approach to obtain the approximately continuous profile. Slicing strategies such as equal‐height scan applied in the 3D printing region and equal‐exposure‐dose scan strategy [13, 14] have been developed. However, the profile precision is mainly guaranteed by a large number of slicing layers and the efficiency of fabrication is limited.…”

Section: Introductionmentioning

confidence: 99%

Improved slicing strategy for digital micromirror device‐based three‐dimensional lithography with a single scan

Huang

Shen

et al. 2017

Micro & Nano Letters

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To improve the profile quality of three-dimensional microstructures, an improved method was proposed in real-time maskless lithography based on digital micromirror device. First, to calculate the spatial distribution of exposure dose for the target profile in design, the relations of the exposure dose and the development depth were investigated. Moreover, a suitable development time was obtained. Second, an improved slicing strategy based on equal-arc algorithm was proposed to reduce the profile error. Different from traditional equal-expose-dose method, this method generated slicing layers with equal arc-length instead of equal-exposure dose. Such an approach has advantages in obtaining a series of suitable section patterns adapting to the curvature variation of the design profile. Finally, an aspheric microlens array was fabricated with this method and the equal-exposure-dose method. Results showed that the resulting microstructure profile by their method was more consistent with the design profile with the same slicing numbers. Moreover, results also showed that the method used can obtain as good profile quality as that of the equal-exposure-dose method with only a half of slicing numbers. This indicated that the proposed method is feasible for achieving good profile quality with slicing efficiency improved remarkably.

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Maskless fabrication of three-dimensional microstructures with high isotropic resolution: practical and theoretical considerations

Cited by 24 publications

References 13 publications

Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography

Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography

P‐178: Flexible AMOLED Display Fabricated by Mask‐less Digital Lithography Technology

Improved slicing strategy for digital micromirror device‐based three‐dimensional lithography with a single scan

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