2016
DOI: 10.7567/jjap.56.01ad03
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Mechanism of light emission and manufacturing process of vertical-type light-emitting diode grown by hydride vapor phase epitaxy

Abstract: We developed a vertical-type light-emitting diode (LED) in which the substrate is removed using a hydride vapor phase epitaxy (HVPE) apparatus consisting of a multi-graphite boat filled with a mixed source and a high-temperature (T ≈ 900 °C) RF heating coil outside the source zone. The new chip-growth process with a significant reduction in the number of production steps is completed in only four steps, namely, photolithography, epitaxial layer growth, sorting, and metallization. We analyze the emission mechan… Show more

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Cited by 5 publications
(6 citation statements)
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“…The first step (see figure 1(b)) for the growth of a 2H Si crystal (or needle) on Si(111), involving nitridation by NH 3 gas, is a melt-back step by GaCl n and AlCl gases among the various gaseous phases generated by the flow of a HCl source gas over the mixed source. NH 3 in the growth of 2H structured Si seems to play a nitridation role, preventing the oxidation of the Si(111) substrate, and acts to activate a Si-Al compound (amorphization state) to be seated on the Si(111) substrate [22][23][24]. The second step (see figure 1(c)) is a nucleation step that commences with the synthesis between the NH 3 gas and the gaseous phases (AlCl and GaCl n ) [22][23][24][25][26][27][28].…”
Section: Methodsmentioning
confidence: 99%
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“…The first step (see figure 1(b)) for the growth of a 2H Si crystal (or needle) on Si(111), involving nitridation by NH 3 gas, is a melt-back step by GaCl n and AlCl gases among the various gaseous phases generated by the flow of a HCl source gas over the mixed source. NH 3 in the growth of 2H structured Si seems to play a nitridation role, preventing the oxidation of the Si(111) substrate, and acts to activate a Si-Al compound (amorphization state) to be seated on the Si(111) substrate [22][23][24]. The second step (see figure 1(c)) is a nucleation step that commences with the synthesis between the NH 3 gas and the gaseous phases (AlCl and GaCl n ) [22][23][24][25][26][27][28].…”
Section: Methodsmentioning
confidence: 99%
“…In the present work, we employed hydride vapor phase epitaxy (HVPE) to 2H structured Si crystals at approximately 1200 • C over a period of 2 h. The mixed-source HVPE approach, combining both in situ HVPE technology and liquid phase epitaxy methods with a mixed source, differs from the continual supply of source materials as used in metal organic chemical vapor deposition (CVD) and other existing HVPE methods [22,23].…”
Section: Introductionmentioning
confidence: 99%
“…Source gases such as HCl, N 2 , and NH 3 were jetted through two quartz tubes for the growth of the epilayers. [23][24][25][26][27][28][29][30][31] Table I shows the growth conditions and measured results of epilayers consisting of a bare chip with an In composition of 11.0% in the active layer. By using a multi-graphite boat filled with the mixed source of In and Ga, the SAG epilayers were deposited by the mixed-source HVPE method on an n-type GaN substrate to fabricate the SAG InGaN LEDs.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…[17][18][19][20][21][22] Over the years, we have developed a simplified process for manufacturing a vertically structured LED without a substrate by a mixed-source HVPE method. 23) The mixed-source HVPE equipment consists of a source zone with an RF heating coil, which is used to control high temperatures (T > 900 °C) and to easily regulate the change in temperature; a multi-graphite boat filled with the mixed source, to insulate against high temperatures and for the control of growth rate through the adjustment of the quantity of the mixed source; and a growth zone with three furnaces. The setup is different from that of previously reported HVPE methods.…”
Section: Introductionmentioning
confidence: 99%
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