Lateral ZnO nanowires (NWs) were selectively grown from the edge of a SiO 2 /Si-Al 2 O 3 -SiO 2 /Si multilayer structure for potential integration into devices using Si processing technology. Microstructural studies demonstrate a two-step growth process in which the tip region, with a diameter of~10 nm, rapidly grew from the Al 2 O 3 surface and, later, a base growth with a diameter of~22 nm overgrew the existing narrow ZnO NW, halting further tip growth. Kinetics studies showed that surface diffusion on the alumina seed surface determined ZnO NW growth rate.