2008
DOI: 10.1088/0953-8984/20/47/472205
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Mesoscopic electronic heterogeneities in the transport properties of V2O3thin films

Abstract: The spectacular metal-to-insulator transition of V 2 O 3 can be progressively suppressed in thin film samples. Evidence for phase separation was observed using microbridges as a mesoscopic probe of transport properties, where the same film possesses domains that exhibit a metal-to-insulator transition with clear first-order features or remain metallic down to low temperatures. A simple model consisting of two parallel resistors can be used to quantify a phase coexistence scenario explaining the measured macros… Show more

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Cited by 14 publications
(19 citation statements)
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“…One assumption is that the conducting thickness of the STO is fixed by the diffusion length of oxygen vacancies at the macroscopic scale, and could be strongly dependent on the growth temperature. Note this parallel resistor with opposite temperature variation mimics an equivalent resistor with non-monotonic temperature variation which presents a resistance maximum at some intermediate temperature 51 , in qualitative agreement with our measurements (Fig.2). To be more quantitative, G i , ρ i and t i will stand for conductance, resistivity and thickness, respectively, while i=1,2 are the LVO and STO.…”
supporting
confidence: 90%
“…One assumption is that the conducting thickness of the STO is fixed by the diffusion length of oxygen vacancies at the macroscopic scale, and could be strongly dependent on the growth temperature. Note this parallel resistor with opposite temperature variation mimics an equivalent resistor with non-monotonic temperature variation which presents a resistance maximum at some intermediate temperature 51 , in qualitative agreement with our measurements (Fig.2). To be more quantitative, G i , ρ i and t i will stand for conductance, resistivity and thickness, respectively, while i=1,2 are the LVO and STO.…”
supporting
confidence: 90%
“…The temperature-resistance characteristic of these films is another parameter useful to evaluate the film quality, and the normalization of the resistance variation can be used for observing the multiple transitions. 43 The ratios of the electrical resistance at 35 and 85…”
Section: Resultsmentioning
confidence: 99%
“…Furthermore, a number of authors report the absence or a significant attenuation of the MIT in ultrathin layers. [10][11][12] In this work, we investigate the influence of a Cr 2 O 3 buffer layer and the V 2 O 3 thickness on the transport properties. We demonstrate a MIT in ultrathin V 2 O 3 layers down to 3.…”
mentioning
confidence: 99%
“…15 Most of the V 2 O 3 thin film work reported in the literature involves the epitaxial deposition of V 2 O 3 on substrates that have a rather large misfit with V 2 O 3 . 3,[10][11][12][13][16][17][18][19][20] In particular, (0001)-oriented Al 2 O 3 with hexagonal unit cell spacings of a ¼ 4.754 Å and c ¼ 12.975 Å is often used as a substrate. Bulk V 2 O 3 has lattice spacings of a ¼ 4.954 Å and c ¼ 14.008 Å .…”
mentioning
confidence: 99%