Metalorganic growth of HgTe and CdTe at low temperatures using diallyltelluride

Abstract

Both HgTe and CdTe films have been grown by metalorganic chemical vapor deposition using a novel tellurium source, diallyltelluride. This compound is found to be less stable than previously examined organotellurium compounds and permits film growth at lower substrate temperatures. This reduced stability is consistent with the presence of double bonds in diallyltelluride compared to single bonds present in alkyl tellurides. Specular HgTe films have been grown at temperatures as low as 180 °C and x-ray analysis indicates that this material is of good crystalline quality.

Structurally Defined Allyl Compounds of Main Group Metals: Coordination and Reactivity

“…Bis(allyl)tellurium(II)114 is a light‐sensitive, distillable liquid with η 1 ‐bound allyl ligands, and is used for metalorganic chemical vapor deposition (see Section 5.5) 115. Fluxional behavior of the allyl ligand was not observed and no indications for allyl exchange at higher temperatures was found in studies on bis(butenyl)tellurium 116.…”

“…The synthesis of “electronic grade” bis(allyl)tellurium was recently reported 114. This compound was used for the low‐temperature deposition of semiconductors CdTe and HgTe 115. Low temperatures are beneficial in these processes, as diffusion or evaporation of the Group 12 component can be reduced.…”

Chemoical Vapor Deposotdoo of Tungsten and Molybdenum Folms From m(η3–C3H5)4 (M=Mo, W)

“…[15] High purity HgTe and CdTe films have been deposited using (?lI-C3H5)2Te. [16] Coupling of allyl radicals to hexadiene in the pyrolysis of both ( II-C3HS)N2(fl I -C3H5) and (l 1 -C3H5)2Te was the dominant reaction *observed upon pyrolysis. [17] Carbon rich films have been reported in ZnSe growth using (inl-C3H5)2Se as a precursor for Se.…”

Strukturell definierte Allylverbindungen der Hauptgruppenmetalle: Koordination und Reaktivität

“…Bis(allyl)tellur(II)114 ist eine lichtempfindliche, destillierbare Flüssigkeit mit η 1 ‐gebundenen Allylliganden, die in der metallorganischen chemischen Gasphasenabscheidung eingesetzt wird (siehe Abschnitt 5.5) 115. Fluktuierendes Verhalten der Allylliganden wurde nicht beobachtet.…”