2014
DOI: 10.1016/j.jcrysgro.2014.06.019
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Metastable nature of InN and In-rich InGaN alloys

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Cited by 66 publications
(61 citation statements)
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“…31,40 Given the fact that the TD density increases with increasing Ga-content in our In-rich InGaN films, 32 we can conclude that the electron mobility is hence mainly governed by residual impurity and alloy scattering. Indeed, alloy scattering might be considered as a prominent scattering mechanism in In-rich InGaN films, since they are prone to alloy compositional fluctuations 32 and formation of metallic In precipitates 41 particularly when grown under In-rich conditions. In contrast to the relatively unchanged electrical conductivity, the thermal conductivity is drastically influenced by increased alloying.…”
Section: A Thermoelectric Properties Of In-rich Ingan Alloysmentioning
confidence: 99%
“…31,40 Given the fact that the TD density increases with increasing Ga-content in our In-rich InGaN films, 32 we can conclude that the electron mobility is hence mainly governed by residual impurity and alloy scattering. Indeed, alloy scattering might be considered as a prominent scattering mechanism in In-rich InGaN films, since they are prone to alloy compositional fluctuations 32 and formation of metallic In precipitates 41 particularly when grown under In-rich conditions. In contrast to the relatively unchanged electrical conductivity, the thermal conductivity is drastically influenced by increased alloying.…”
Section: A Thermoelectric Properties Of In-rich Ingan Alloysmentioning
confidence: 99%
“…The InN film decomposes to indium metal and N2 gas even at deposition temperatures as low as 500 °C, 4 setting an upper limit for the deposition; this forces the use of use NH3/In(CH3)3 ratios on the order of 100,000 due to the poor reactivity of ammonia at these low temperatures. 5 An alternative approach for depositing InN is a time-resolved CVD technique where the poor reactivity of NH3 is overcome by allowing it to react with chemisorbed indium-containing surface moieties rather than relying on this reactivity in the (dilute) gas phase.…”
Section: Introductionmentioning
confidence: 99%
“…Согласно теории [17], при росте нитридов в металлобогащенных условиях поверхность роста смачивается 2 МС металла, а остальной излишек металла собирается в капли. Ограничение в накоплении 1.5−2 монослоя In во время фазы роста в металлобо-гащенных условиях необходимо для подавления обра-зования капель металлического индия на поверхности и, таким образом, проблем с формированием кластеров металлического In внутри слоя InN [18,19]. Средняя скорость роста слоев InN в структурах 55 и 61 со-ставляла ∼ 0.25 мкм/ч.…”
Section: методика экспериментаunclassified