Micro‐Solid Oxide Fuel Cell Membranes Prepared by Aerosol‐Assisted Chemical Vapor Deposition

Abstract

Free‐standing electrolyte membranes for low‐temperature micro‐solid oxide fuel cells (micro‐SOFCs) are prepared by aerosol‐assisted chemical vapor deposition (AA‐CVD), a cost‐effective, non‐vacuum thin‐film deposition technique. Thin, yttria‐stabilized zirconia (YSZ) membranes (50–400 nm) as well as bilayer membranes of YSZ and gadolinia‐doped ceria are prepared at temperatures of 600 °C and below. AA‐CVD, which is a gas‐phase deposition method, allows for the synthesis of precursor‐free crystalline layers, thereby limiting the development of tensile stress. High membrane survival rates of around 90% are thus obtained. The columnar structure of the electrolyte ensures high oxygen‐ion conductivity and results in negligible ohmic losses. Using sputtered platinum electrodes, the demonstration of a micro‐SOFC based on AA‐CVD electrolyte is achieved and first power density data of 166 mW cm‐2 at 410 °C is obtained.

A thermally self-sustained micro-power plant with integrated micro-solid oxide fuel cells, micro-reformer and functional micro-fluidic carrier

“…This is in contrast to findings of Kerman et al [20] who reported faster diffusion and therefore agglomeration of platinum in hydrogen atmosphere. A similar behavior of a Pt cathode was found by Schlupp et al [40] on free-standing aerosolassisted CVD YSZ membranes. Their YSZ has a very similar microstructure to the PLD 3YSZ used in this study.…”

Advances in Deposition of Main‐Group Metal Oxides and Rare‐Earth Oxides from Metal Enolates

“…Thin layers of YSZ were deposited from [Zr(acac) 3 ] and [Y(acac) 3 ] by AA-CVD 94,95 . It could be shown that the higher the precursor concentration, the lower the porosity of the deposited layer 94 .…”

“…It could be shown that the higher the precursor concentration, the lower the porosity of the deposited layer 94 . These films were proposed as free-standing electrolyte membranes for solid oxide fuel cells 95 .…”

Platinum Thin‐Film Electrodes Prepared by a Cost‐Effective Chemical Vapor Deposition Technique

“…[25] Island growth is common for metals deposited on insulators, as bonds between film atoms are stronger than bonds between film atoms and the substrate. Previously, we have applied this technique to the deposition of oxygen ion conducting electrolyte thin-filmss [38][39][40][41][42] and membranes [43] for micro-solid oxide fuel cells. [26] In chemical vapor deposition, however, formation of coherent thin-filmss may require higher film thicknesses.…”