2007
DOI: 10.1016/j.tsf.2006.11.119
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Microcrystalline silicon deposition: Process stability and process control

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Cited by 32 publications
(16 citation statements)
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“…14 The deterioration of V oc and FF in relatively thin cells can be partially mitigated by using substrates with smoother surface morphology (e.g., smooth U-shape instead of steep V-shape), 15,20 by implementing silicon oxide-based (SiO x :H) doped layers, 18,21,22 and by optimizing the plasma deposition conditions. 18,23,24 However, it is still challenging to effectively maintain high V oc and FF at thick absorber layers. Therefore, textured substrates which can provide efficient light trapping and maintain high V oc and FF for thick absorber layers under high deposition rates are highly desirable.…”
mentioning
confidence: 99%
“…14 The deterioration of V oc and FF in relatively thin cells can be partially mitigated by using substrates with smoother surface morphology (e.g., smooth U-shape instead of steep V-shape), 15,20 by implementing silicon oxide-based (SiO x :H) doped layers, 18,21,22 and by optimizing the plasma deposition conditions. 18,23,24 However, it is still challenging to effectively maintain high V oc and FF at thick absorber layers. Therefore, textured substrates which can provide efficient light trapping and maintain high V oc and FF for thick absorber layers under high deposition rates are highly desirable.…”
mentioning
confidence: 99%
“…1): It is well known that an increase of I RS C for the initial growth phase induces an overall increase of I RS C for the later layer growth. 12 Increasing SC avoids strongly deviating crystallinity from advantageous I RS C of $60%-70% 1,12,15,[18][19][20] ( Fig. 1).…”
Section: Methodsmentioning
confidence: 99%
“…1,17 The highest solar cell performances were detected for absorber layers with Raman crystallinities of about 60%-70%. 1,12,15,[18][19][20] The ideal evolution of the Raman crystallinity throughout the absorber layer is still a matter of debate. Therefore, this is one of the questions that will be addressed here.…”
Section: Introductionmentioning
confidence: 99%
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