2000
DOI: 10.1063/1.1329871
|View full text |Cite
|
Sign up to set email alerts
|

Microfour-point probe for studying electronic transport through surface states

Abstract: Microfour-point probes integrated on silicon chips have been fabricated with probe spacings in the range 4–60 μm. They provide a simple robust device for electrical transport measurements at surfaces, bridging the gap between conventional macroscopic four-point probes and scanning tunneling microscopy. Measurements on Si(111) surfaces in ultrahigh vacuum reveal that the Si(111)–√3×√3–Ag structure induced by a monolayer of Ag atoms has a four-point resistance two orders of magnitude lower than that of the Si(11… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
53
1

Year Published

2002
2002
2022
2022

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 71 publications
(55 citation statements)
references
References 16 publications
1
53
1
Order By: Relevance
“…One application for such probes, which has not yet been explored is local measurement of surface state conductivity of clean surfaces in ultrahigh vacuum, where minimal influence of the contacts on the surface properties is highly desired. 24 …”
Section: Discussionmentioning
confidence: 99%
“…One application for such probes, which has not yet been explored is local measurement of surface state conductivity of clean surfaces in ultrahigh vacuum, where minimal influence of the contacts on the surface properties is highly desired. 24 …”
Section: Discussionmentioning
confidence: 99%
“…4, because of a possible Schottky barrier between the surface states and the underlying bulk states [19] or a possible pn-junction between the surface-space-charge layer and the interior bulk. But, this simple picture appears to be at least qualitatively true, as demonstrated in recent measurements [20][21][22][23]. Two types of such microscopic four-point probes are introduced in Section 4.…”
Section: Electrical Conduction At Semiconductor Surfacesmentioning
confidence: 99%
“…Rather it must be attributed to the surface-state band inherent in the ffiffi ffi 3 p  ffiffi ffi 3 p -Ag superstructure [20]. Although the surface-state conductivity on this surface had been detected by macroscopic four-probe measurements as a carrier-doping effect into the surface-state band, as mentioned before, micro-four-point probes enabled the direct detection of the contribution of the surface-state conductance [20,22].…”
Section: Microscopic Four-point Probesmentioning
confidence: 99%
See 1 more Smart Citation
“…A four-tip scanning tunneling microscope ͑STM͒ 3 and a microscopic four-point probe ͑4PP͒ based on silicon cantilevers were reported. [4][5][6] The latter are fabricated by a bulkmicromachining process and have already been commercialized by Capres S/A. 7 The negative photoresist SU-8 is used for the fabrication of structures with high aspect ratio and has mechanical properties that allow it to be introduced as base material for an increasing number of micromechanical devices.…”
Section: Introductionmentioning
confidence: 99%