Microlens formation using heavily dyed photoresist in a single step

Cox, Chris; Planje, Curtis; Brakensiek, Nick; Zhu, Zhaojie; Mayo, Jonathan W.

doi:10.1117/12.654531

Cited by 3 publications

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“…High refractive index (high- n ) and low birefringence (Δ n ) combined with good thermal stability and high optical transparency are the basic concerns in designing optical polymer coatings for high-performance CMOS image sensors (CIS). – Conventional high- n optical polymers such as sulfur-containing epoxy, poly(methyl methacrylate) (PMMA), and polyurethane can meet most of the requirements. However, the relatively poor thermal stability of the polymers often limits their wide applications.…”

Section: Introductionmentioning

confidence: 99%

Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film

et al. 2007

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A series of semialicyclic polyimides (PIs) have been successfully prepared by the polycondensation of two alicyclic dianhydrides, 1,2,3,4-cyclobutanetetracarboxylic dianhydride (CBDA) and 1,2,4,5-cyclohexanetetracarboxylic dianhydride (CHDA) with two sulfur-containing aromatic diamines, 4,4′-thiobis [(pphenylenesulfanyl)aniline] (3SDA) and 2,7-bis(4-aminophenylenesulfanyl)thianthrene (APTT), respectively, by a two-step polymerization procedure via the soluble poly(amic acid) (PAA) precursors. Flexible and tough PI films were obtained with a tensile strength greater than 82 MPa and elongation at breaks higher than 12%. The films showed good thermal and thermal-oxidative stability without significant weight loss up to 400 °C, both in air and nitrogen. The glass-transition temperatures of the PIs ranged from 236.5 to 274.1 °C. Good optical transparency, including the cutoff wavelengths lower than 350 nm and transmittances higher than 80% at 400 nm, was achieved for all the PI films. The refractive indices of the PI films were in the range of 1.6799-1.7130 measured at 632.8 nm, which agreed well with the values calculated by the time-dependent density functional theory (TD-DFT). In addition, PAA-II a (CHDA-3SDA) showed a good affinity with silica-modified TiO 2 nanoparticles. The hybrid system with 45 wt % load of TiO 2 nanoparticles, combined with the photobase generator N-{ [(4,5-dimethoxy-2-nitrobenzyl)oxy]carbonyl}2,6-dimethylpiperidine (DNCDP) exhibited good photolithographic characteristics. A fine negative pattern with a resolution of approximately 4 µm was successfully printed on the hybrid film. The cured PI-II a -TiO 2 hybrid film exhibited a refractive index of 1.8100 at 632.8 nm.

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Section: Introductionmentioning

confidence: 99%

Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film

et al. 2007

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Optical measurement of exposure depth and refractive index in positive photoresists

Wood¹,

Brissonneau²,

Brückner³

et al. 2013

Optics Communications

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Recent progress in negative-working photosensitive and thermally stable polymers

Higashihara

Saito

Mizoguchi

et al. 2013

Reactive and Functional Polymers

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Microlens formation using heavily dyed photoresist in a single step

Cited by 3 publications

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Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film

Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film

Optical measurement of exposure depth and refractive index in positive photoresists

Recent progress in negative-working photosensitive and thermally stable polymers

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Microlens formation using heavily dyed photoresist in a single step

Cited by 3 publications

References 0 publications

Optically Transparent Sulfur-Containing Polyimide−TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO2 Nanocomposite Film

Optically Transparent Sulfur-Containing Polyimide−TiO2 Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO2 Nanocomposite Film

Optical measurement of exposure depth and refractive index in positive photoresists

Recent progress in negative-working photosensitive and thermally stable polymers

Contact Info

Product

Resources

About

Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film

Optically Transparent Sulfur-Containing Polyimide−TiO₂ Nanocomposite Films with High Refractive Index and Negative Pattern Formation from Poly(amic acid)−TiO₂ Nanocomposite Film