Recent progress in negative-working photosensitive and thermally stable polymers

Higashihara, Tomoya; Saito, Yuta; Mizoguchi, Katsuhisa; Ueda, Mitsuru

doi:10.1016/j.reactfunctpolym.2012.04.020

Cited by 19 publications

(15 citation statements)

References 86 publications

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“…solar cells, OLEDs, OFETs, OTFTs [31][32][33][34]. In this regard, heteroaromatic small molecules and hybrid compounds also have been largely investigated [35].…”

Section: Introductionmentioning

confidence: 99%

Selenylated-oxadiazoles as promising DNA intercalators: Synthesis, electronic structure, DNA interaction and cleavage

et al. 2020

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“…solar cells, OLEDs, OFETs, OTFTs [31][32][33][34]. In this regard, heteroaromatic small molecules and hybrid compounds also have been largely investigated [35].…”

Section: Introductionmentioning

confidence: 99%

Selenylated-oxadiazoles as promising DNA intercalators: Synthesis, electronic structure, DNA interaction and cleavage

et al. 2020

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“…Compared with conventional systems, PSPI does not require additional resist‐based photolithography, thereby allowing the simplification of manufacturing processes. Thus, PSPI has emerged as a promising material for various practical applications, such as passivation layers, dielectric layers, and buffer coatings in integrated circuits (ICs) 14,15 …”

Section: Introductionmentioning

confidence: 99%

The improved photosensitivity of photosensitive polyimides containing o‐nitrobenzyl ether groups induced by the addition of photoacid generator

Song

Heo

Baek

et al. 2021

Journal of Polymer Science

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In this article, photosensitive polyimides (PSPIs) with photosensitive groups, o‐nitrobenzyl ether groups (Nb), were successfully synthesized based on 2,2′‐dihydroxy benzophenone‐3,3′,4,4′‐tetracarboxylic dianhydride and on diamine containing ethylene glycol chains (ODA). Also, a series of polyimide (PI), ODA‐1‐PI, ODA‐3‐PI, and ODA‐5‐PI with a number of ethylene glycol chains of 1, 3, and 5 were prepared to investigate the relationship between structure and solubility. Interestingly, ODA‐5‐PI, which possesses a large number of ethylene glycols, exhibited the most excellent solubility. Therefore, due to the good solubility of ODA‐5‐PI in organic solvents and alkaline solutions, a PSPI, poly(1,4‐phenyleneoxy‐3,6,9,12,15‐pentaoxaoctane‐1,4‐phenylene‐2,2′‐di[2‐nitrobenzyloxy]benzophenone‐3,3′,4,4′‐tetracarboxdiimide), named ODA‐5‐PSPI, was synthesized by linking Nb, which is a photosensitive group. Aiming at producing positive tone patterns, the synthesized ODA‐5‐PSPI was exposed to UV irradiation and then to a post‐exposure bake. Afterward, it was developed using a 2.38 wt% tetramethylammonium hydroxide solution. Furthermore, a photoacid generator (PAG) was additionally incorporated for a micropatterning process. Notably, in the presence of the PAG, the photocleavage of ODA‐5‐PSPI occurred not only by the intramolecular rearrangement of Nb but also by its hydrolysis reaction. As a result, due to the synergistic effect of photocleavage, the micropatterning of ODA‐5‐PSPI with PAG could be clearly obtained with less energy (2.0 J/cm2) compared with that without PAG (3.6 J/cm2). Therefore, through the addition of PAG, the photosensitivity was improved by 45%.

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“…Furthermore, it is important to pattern the micro-circuit on the photosensitive material by photolithography process [7]. Generally, there are some factors like acid value of oligomer, exposure time, UV light intensity, type of developers, development time, hard baking temperature and so on, to influence the resolution of pattern [8][9][10]. In this study, we attempt to explore the pattern resolution of negative-work photosensitive polymer by regulating the solid content of polyester acrylate.…”

Section: Introductionmentioning

confidence: 99%

Study on Preparation and Photolithography of Negative-work Photosensitive Polyester Acrylate

Hsu

Cheng

2018

J. Photopol. Sci. Technol.

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This study aims to investigate fabrication and photolithography of negative-work photosensitive transparent insulation material for one glass solution (OGS) applying in touch panel. In this work, two reactive monomers, namely, dipentaerythritol hexaacrylate (DPHA) and tri (propylene glycol) diacrylate (TPGDA), were respectively blended with the mixture of 50% 1-hydroxy-cyclohexylphenyl-ketone and 50% benzophenone, and polyester acrylic oligomer in propylene glycol monomethyl ether acetate (PGMEA); and the photolithography of resulted negative-work photosensitive transparent insulation materials with different solid content was determined by characteristic curve and the optical microscope (OM). As shown in the results, it was found that the photolithographic resolution, which is termed by the ratio of line width to line space, is significantly affected by the solid content of as-prepared negative-work photosensitive polymer. Based on 8 µm line width and space at 1 µm film thickness, the photolithographic resolution of photosensitive polyester acrylate containing 19.7 wt% solid content could reach 1.1 after irradiating by 600 mJ/cm 2 ultraviolet visible light and developing by 0.01 wt% KOH solution for 60 seconds in this explore.

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Recent progress in negative-working photosensitive and thermally stable polymers

Cited by 19 publications

References 86 publications

Selenylated-oxadiazoles as promising DNA intercalators: Synthesis, electronic structure, DNA interaction and cleavage

Selenylated-oxadiazoles as promising DNA intercalators: Synthesis, electronic structure, DNA interaction and cleavage

The improved photosensitivity of photosensitive polyimides containing o‐nitrobenzyl ether groups induced by the addition of photoacid generator

Study on Preparation and Photolithography of Negative-work Photosensitive Polyester Acrylate

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