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Described herein is the performance of developable KrF BARCs as applied to line/space patterning including resolution limits for these materials, proximity effects on undercut for these materials, and DOF provided for these materials. Also included herein are the effects of undercut and scumming, as well as photoresist budget saving, when using a wet developable BARC for deep via etching. It can be seen when using a developer soluble BARC for line/space patterning DOF provides a wide processing margin, line pitch has little effect on BARC undercut, and resolution is high. When using a developer soluble BARC for contact hole printing and deep via etching, photoresist budgets are increased and BARC undercut has little effect on via size and shape.

The list ofdesired properties for a spin-on 193-nm BARC steadily increases. In response, crosslinkable polymers from different chemical families than the conventional acrylics and vinyls are being studied for applicability in preparing improved thermosetting BARCs. Alternate polymer platforms discussed in this paper include polyethers, polyesters, polyurethanes, and polysaccharides. A BARC that uses a blend or mixture of commercially-available polymers for the binder is highlighted and the product's performance is described. The BARC parameters that are discussed include film properties, flash point, optical data and reflectivity, solution and spin-bowl compatibility, plasma etching rate, resist profile, conformality, and metals content. Based on the test results outlined in this paper, the polymer blend BARC J1M2218-56 is expected to advance towards commercialization.

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