2000
DOI: 10.1143/jjap.39.4532
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Micropatterning of Chemical-Vapor-Deposited Diamond Films in Electron Beam Lithography

Abstract: The micropatterning of chemical-vapor-deposited (CVD) diamond films using electron beam lithography technology has been investigated. The use of metal naphthenates as mask resist materials is proposed, because of their resistance to oxygen plasma in order to form an oxide film on the surface. The exposure characteristics of metal naphthenates, as well as the etching characteristics of CVD diamond and metal naphthenate films processed with electron cyclotron resonance (ECR) oxygen plasma we… Show more

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Cited by 13 publications
(5 citation statements)
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“…The surface treatment of these materials, such as chemical modification in-area and in-depth and/or nano-and micro-level etching, will be very important for developing in micro-machines and micro-devices. 4,[8][9][10][11][12][13][14][15][16] In general, chemical modifications such as etching and oxide formation have been done by laser beam ablation and/or thermal oxidation at high temperature. 1,2,12,13 On the other hand, polishing these materials has been done with some fine particles such as diamond that have excellent hardness.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The surface treatment of these materials, such as chemical modification in-area and in-depth and/or nano-and micro-level etching, will be very important for developing in micro-machines and micro-devices. 4,[8][9][10][11][12][13][14][15][16] In general, chemical modifications such as etching and oxide formation have been done by laser beam ablation and/or thermal oxidation at high temperature. 1,2,12,13 On the other hand, polishing these materials has been done with some fine particles such as diamond that have excellent hardness.…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, they can also be used soon as a semiconductor material with a wide-band gap, which is very useful for some power devices. Thus, SiC and diamond are promising materials in the precision machining and electrical industries. The surface treatment of these materials, such as chemical modification in-area and in-depth and/or nano- and micro-level etching, will be very important for developing in micro-machines and micro-devices. , In general, chemical modifications such as etching and oxide formation have been done by laser beam ablation and/or thermal oxidation at high temperature. ,,, On the other hand, polishing these materials has been done with some fine particles such as diamond that have excellent hardness. ,, However, the surface treatments of SiC and diamond are very difficult under the mild conditions that are necessary for the film-type fabricated devices. , …”
Section: Introductionmentioning
confidence: 99%
“…The sensitivity of polysiloxane film and that of PMMA film were 5.5 × 10 −5 and 6.0 × 10 −5 C/cm 2 respectively. The sensitivity of polysiloxane is in good agreement with that of PMMA [10]. The electron dose of polysiloxane was typically set to be 6.7 × 10 −4 C/cm 2 .…”
Section: A Nanofabrication Of 3d Diamond Moldsmentioning
confidence: 56%
“…The samples were processed with ECR oxygen plasma under etching conditions of a microwave power of 100 W, an oxygen gas flow rate of 3 sccm and background gas pressure of 0.4 Pa, which provide a high etching selectivity. 14,15) Finally, the Bi 4 Ti 3 O 12 octylate mask patterns remaining on the diamond films were removed with phosphoric acid at 80 C.…”
Section: Fabrication Of Diamond Moldmentioning
confidence: 99%