In this paper we describe the use of electron backscattered diffraction (EBSD) for the characterisation of nitride thin films, and report its use in the study of the spatial variation of strain across an epitaxially laterally overgrown GaN (ELOG) thin film. We also discuss the combination of luminescence and EBSD measurements to enable luminescence properties of samples to be directly correlated with their crystallographic properties. We compare photoluminescence spectra and EBSD measurements from a set of GaN thin films grown on off-axis sapphire substrates, revealing the tilt of a GaN thin film grown on a 10 off-axis sapphire substrate to be responsible for the observation of luminescence defect bands in this film. We finally report on the use of EBSD to identify zinc blende regions in a predominantly wurtzite MBE film, with cathodoluminescence used to obtain correlated luminescence spectra.
IntroductionThe acquisition of electron backscattered diffraction (EBSD) patterns in the scanning electron microscope is a very powerful method for the microstructural characterisation of crystalline materials. EBSD is presently used predominantly in metallurgy [1], being applied to the measurement of texture [1-2], and for the identification of different crystalline phases. Wilkinson [3] and Troost et al. [4] have applied EBSD to the measurement of strain in SiGe epilayers, while Baba-Kishi [5] has used EBSD to investigate crystallographic polarity in non-centrosymmetric materials. Their results make EBSD an attractive technique to adapt for the characterisation of nitride thin films.We can for example use EBSD to measure the orientation between nitride thin films and their substrates and measure tilt in nitride thin films [6], we may identify zincblende inclusions in a predominantly wurtzite film and vice-versa. We may also map the strain in nitride films due to the lattice mismatch between the nitride films and their substrates, in particular investigate lateral variations in strain in epitaxially laterally overgrown GaN (ELOG) films. Finally, we can investigate film polarity [7].