The ferromagnetic semiconductor GaMnN has been produced by two methods – ion implantation and metalorganic chemical vapor deposition (MOCVD). P‐type, n‐type, and intrinsic GaN layers grown by MOCVD were ion‐implanted with 3 × 1016/cm2 Mn+ at 200 keV and subsequently annealed under various conditions. Considerable lattice damage is observed by analyzing the peak asymmetry in X‐ray diffraction; annealing only partially recovers this damage. Second phases (MnxNy, GaxMny and Mn4–xGaxN1–y) have been detected upon subsequent annealing. Epitaxial GaMnN layers have been fabricated by MOCVD using Cp2Mn as the manganese precursor. These films were specular and exhibited an increasing dark reddish‐brown tinge with increasing Mn‐concentration and thickness, consistent with GaMnN grown by other methods. X‐ray diffraction revealed symmetric peaks with almost identical lattice parameters to undoped GaN, and no macroscopic second phase formation. Magnetic hysteresis is observed in the ion implanted as well as in MOCVD‐grown films at room temperature. Stronger magnetization was present in the implanted p‐type films and unannealed MOCVD‐grown films, providing evidence that Fermi level control is important for the magnetic properties of these materials. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)