2010 35th IEEE Photovoltaic Specialists Conference 2010
DOI: 10.1109/pvsc.2010.5615853
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Microstructure and surface chemistry of nanoporous “black silicon” for photovoltaics

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Cited by 5 publications
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“…In contrast, the metal‐catalyzed wet chemical etching is free of ion damage. On the other hand, the MCE process is highly oxidizing and can leave behind surface regions of elevated defect concentrations associated with sub‐oxide fractions 13. Recently it was shown that an additional anisotropic etching step in tetramethylammonium hydroxide (TMAH) reduces the surface area of the nano‐structure, leading to an increase in the effective lifetime 7…”
Section: Introductionmentioning
confidence: 99%
“…In contrast, the metal‐catalyzed wet chemical etching is free of ion damage. On the other hand, the MCE process is highly oxidizing and can leave behind surface regions of elevated defect concentrations associated with sub‐oxide fractions 13. Recently it was shown that an additional anisotropic etching step in tetramethylammonium hydroxide (TMAH) reduces the surface area of the nano‐structure, leading to an increase in the effective lifetime 7…”
Section: Introductionmentioning
confidence: 99%
“…Lv et al reviewed the recent achievements and applications of black silicon with femtosecond laser pulses [ 28 ]. In this review, black silicon was applied to many fields, such as photodiodes [ 29 , 30 , 31 , 32 ], photodetectors [ 33 , 34 , 35 , 36 , 37 ], solar cells [ 38 , 39 , 40 , 41 , 42 , 43 , 44 , 45 , 46 , 47 , 48 , 49 ], field emission [ 50 , 51 , 52 , 53 ], luminescence [ 54 , 55 ], hydrophobic surface [ 56 , 57 , 58 ], etc. They pointed out that the laser-irradiated process is relatively slow compared to other methods and that the laser-irradiated process needs to be studied further.…”
Section: Introductionmentioning
confidence: 99%
“…A thin layer of 10-to 20-nm thermally grown SiO 2 has been used at NREL to passivate the front surface of black Si solar cells. Thermally grown SiO 2 conformally covers the Si nanostructure [6] and provides reasonable passivation quality [1,2]. However, this step often takes a separated hightemperature oxidation and could compromise the cost benefit of the liquid-phase black Si antireflection.…”
Section: Introductionmentioning
confidence: 99%