2001
DOI: 10.1111/j.1151-2916.2001.tb00810.x
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Microstructure of a Molybdenum Nitride Layer Formed by Nitriding Molybdenum Metal

Abstract: For pure molybdenum nitrided at 1373 K in NH 3 gas, microstructural observations of a molybdenum nitride layer were conducted through a transmission electron microscope. The molybdenum nitride layer consisted of two molybdenum nitrides: an outer one of ␥-Mo 2 N and an inner one of ␤-Mo 2 N. A great number of (011)[01 1] type twins were observed in the ␤-Mo 2 N phase, whereas the microstructure of the ␥-Mo 2 N phase was almost free from lattice defects except for slightly observed {111}͗112͘ type twin.

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Cited by 26 publications
(15 citation statements)
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“…depending on applications. The thickness of films can reach 100 μm after a 16 h thermal treatment in NH3 flow [57]. According to the previously described works, the structure of substrates can be chosen to promote the structure of molybdenum nitrides: δ-MoN films/hexagonal BN [36] or δ-MoN/Al2O3 and γ-Mo2N/SrTiO3 [56].…”
Section: Thermal Processesmentioning
confidence: 99%
See 1 more Smart Citation
“…depending on applications. The thickness of films can reach 100 μm after a 16 h thermal treatment in NH3 flow [57]. According to the previously described works, the structure of substrates can be chosen to promote the structure of molybdenum nitrides: δ-MoN films/hexagonal BN [36] or δ-MoN/Al2O3 and γ-Mo2N/SrTiO3 [56].…”
Section: Thermal Processesmentioning
confidence: 99%
“…Nagae et al [57] have prepared molybdenum nitride coatings from a pure molybdenum sheet 1 mm thick prepared by powder metallurgy. The average grain size is equal to 30 μm.…”
Section: Thermal Processesmentioning
confidence: 99%
“…They have been investigated for their corrosion resistance [11], superconductivity [12], wear resistance [13], diffusion resistance [14] and electrocatalytic activity in the hydrogen evolution reaction [15]. The charge storage capability of metal nitrides in electrochemical capacitor ("supercapacitor") electrodes has grown in importance recently due to reports of high capacities in some materials [16], e.g.…”
Section: Introductionmentioning
confidence: 99%
“…They also have high melting point, good chemical stability, low electrical resistivity; they can be used as gate electrode materials for high-k gate dielectrics [1][2][3]. Their surface oxides (MO x ) of lamellar structure offer good lubricating properties at high temperature.…”
Section: Introductionmentioning
confidence: 99%