We
report a method to prepare hydrophobic, antireflective mesoporous
silica-based films on polymer substrates from sol–gel approaches
combined with an ammonia vapor treatment (AVT) to avoid any thermal
curing. Strategies involving the combination of direct co-condensation
of pure and methylated-hybrid silica precursors with further post-functionalization
with methyl groups were used. Coatings with the best reflectance (transmittances
up to 99.6% in the visible range), full water repellence, and good
resistance to abrasion (failures occurred at the substrate interfaces)
were obtained by optimizing both sol–gel and AVT conditions.
Using in situ, time-resolved, spectroscopic ellipsometry, we demonstrate
that the structure of the film can be significantly and rapidly modified
from molecular to mesoscales, under the action of H2O and
NH3 vapors. The identified mechanism follows a local dissolution/condensation
associated to Ostwald ripening that can easily be controlled by adjusting
the applied conditions. These structural modifications were much less
intense for co-condensed methylated mesoporous matrices due to the
stabilizing effect of the organic pendant groups. These conclusions
are supported by complementary characterizations obtained with environmental
ellipsometry porosimetry, GI-SAXS, SEM-FEG, UV–visible transmittance,
crockmeter, and FTIR.