2010
DOI: 10.1088/0957-4484/21/6/065202
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Modelling and fabrication of GaAs photonic-crystal cavities for cavity quantum electrodynamics

Abstract: In this paper, we present recent progress in the growth, modelling, fabrication and characterization of gallium arsenide (GaAs) two-dimensional (2D) photonic-crystal slab cavities with embedded indium arsenide (InAs) quantum dots (QDs) that are designed for cavity quantum electrodynamics (cQED) experiments. Photonic-crystal modelling and device fabrication are discussed, followed by a detailed discussion of different failure modes that lead to photon loss. It is found that, along with errors introduced during … Show more

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Cited by 27 publications
(27 citation statements)
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“…We observe that the cavity Qs depend on polarization of the light in the fiber, of contact position on the nanobeam, and of angle between the nanobeam and the fiber [12]. We also present recent progress in the growth and fabrication of 2D photonic crystal slab nanocavities in GaAs with InAs QDs [6,7]. Fig.…”
mentioning
confidence: 79%
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“…We observe that the cavity Qs depend on polarization of the light in the fiber, of contact position on the nanobeam, and of angle between the nanobeam and the fiber [12]. We also present recent progress in the growth and fabrication of 2D photonic crystal slab nanocavities in GaAs with InAs QDs [6,7]. Fig.…”
mentioning
confidence: 79%
“…Higher values of Q lead to longer photon lifetimes in the cavity (improved chance of light-matter interaction), and smaller values of V lead to higher field intensities (stronger light-matter interaction). The importance of the ratio Q/V can be seen in the expression for Purcell enhancement (F p / Q/V) of spontaneous emission and for vacuum Rabi splitting (VRS / Q/HV) [1,2,[5][6][7]. The pursuit of high Q, small V nanocavities has thus been a major focus of efforts in the semiconductor cavity QED community.…”
mentioning
confidence: 99%
“…There are situations, however, where introducing an additional mask layer is not desirable, especially when oxides or metals have been already deposited on the sample for other purposes, e.g., for the fabrication of superconducting single photon detectors [16]. In this letter we present a soft-mask process where a circuit is etched directly into a GaAs membrane through the patterned electron-beam resist [17,18]. Unlike hard-mask processes, this method involves fewer fabrication steps, reduces the need for expensive deposition equipment and operates at lower temperatures.…”
Section: Introductionmentioning
confidence: 99%
“…Inevitably, the inability to accurately fabricate features with a size which is on the order of a visible wavelength leads to imperfection. Structural characteristics which are affected during fabrication include surface roughness, sidewall angle, and the size and position of holes [25]. This has attracted much research to determine the tolerance of structures to variation of physical parameters which perturb the photonic bandgap [19,[26][27][28].…”
Section: Introductionmentioning
confidence: 99%