2000
DOI: 10.1007/s11664-000-0123-3
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Molecular beam epitaxial growth of BGaAs ternary compounds

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Cited by 47 publications
(33 citation statements)
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“…Newman [4] shows that in liquid-encapsulated Czochralski-grown BGaAs the boron atoms occupy primarily isovalent gallium lattice sites but also form antisite defects (B As ) when grown from Ga-rich melts. Gupta et al [5] find a monotonic increase (8.25 meV) of the band gap up to 0.25% boron. Between 0.25 and 1% B the gap remains constant.…”
Section: Introductionmentioning
confidence: 95%
“…Newman [4] shows that in liquid-encapsulated Czochralski-grown BGaAs the boron atoms occupy primarily isovalent gallium lattice sites but also form antisite defects (B As ) when grown from Ga-rich melts. Gupta et al [5] find a monotonic increase (8.25 meV) of the band gap up to 0.25% boron. Between 0.25 and 1% B the gap remains constant.…”
Section: Introductionmentioning
confidence: 95%
“…8,9 It would be beneficial, though, to significantly increase the boron concentration in a high quality alloy material.…”
Section: Alternative Boron Precursors For Bgaas Epitaxymentioning
confidence: 99%
“…There were few reports on BGaAs and BInGaAs alloys since the pioneering work of Geisz et al [1]. BGaAs alloy has been prepared by molecular beam epitaxy [2,3] and metalorganic vapour phase epitaxy (MOVPE) [4][5][6]. The growth of lattice-matched BInGaAs-layers on GaAs has also been studied by Gottschalch et al [4] and solar cells structure with BInGaAs as base layer have been grown and successfully tested [7].…”
Section: Introductionmentioning
confidence: 99%