2022
DOI: 10.1016/j.surfin.2022.101772
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Molecular beam epitaxy growth of high mobility InN film for high-performance broadband heterointerface photodetectors

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Cited by 29 publications
(30 citation statements)
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“…[9,10] Currently, photodetectors have been reported with significant performance based on InGaAs, Si, GaN, PdSe, MoS 2 , HgTe, etc. [11][12][13] However, these materials are facing many technical challenges, such as complex manufacturing process, low operating temperature, etc. Semiconducting nanomaterials have attracted widespread attention in the scientific community due to their excellent performance in various fields.…”
Section: Introductionmentioning
confidence: 99%
“…[9,10] Currently, photodetectors have been reported with significant performance based on InGaAs, Si, GaN, PdSe, MoS 2 , HgTe, etc. [11][12][13] However, these materials are facing many technical challenges, such as complex manufacturing process, low operating temperature, etc. Semiconducting nanomaterials have attracted widespread attention in the scientific community due to their excellent performance in various fields.…”
Section: Introductionmentioning
confidence: 99%
“…This work provides valuable guidance for realizing ultrafast photodetectors by axial NRA heterojunction. Firstly, this manuscript not only provides a strategy to break through the material arrangement limit of the bandgap but also introduces a method to prepare a InN/GaN Heterostructure 260 ms/780 ms 37.07@-1.1V [54] InN/AlN/Si Heterostructure 10 ms/18 ms 3.3×10 −6 @0V [55] relatively evenly NRA heterojunction. Secondly, the photodetectors based on the NRA heterojunction reveal outstanding performance.…”
Section: Discussionmentioning
confidence: 99%
“…Emerging materials, such as III-nitride-based semiconducting materials, two-dimensional materials, organic materials, and perovskite materials, have received a lot of attention in recent years. [9][10][11][12][13][14][15][16][17][18][19] Among the III-nitride family, InN materials are attractive for optoelectronic device applications due to their suitable bandgap and high electron mobility. 19 Ali et al fabricated the high-quality InN/GaN heterointerface and obtained high-performance broadband PDs.…”
Section: Introductionmentioning
confidence: 99%
“…19 Ali et al fabricated the high-quality InN/GaN heterointerface and obtained high-performance broadband PDs. 17 Two-dimensional materials with excellent transparency, extraordinary flexibility, high conductivity, and direct bandgaps have been successfully used not only as electrodes but also as active layers in optoelectronic devices. 18 Zhang et al employed two-dimensional materials of Ta 2 NiSe 5 and GaSe to construct a VIS-near infrared (NIR) dual-band photodetector with a heterogeneous structure.…”
Section: Introductionmentioning
confidence: 99%