Momenta of the particles emitted by a target heavily irradiated with low-energy ions

Beshenkov, V. G.; Grigor’ev, A. B.; Марченко, В. А.

doi:10.1134/1.1479993

Cited by 3 publications

(1 citation statement)

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“…These steady state concentrations are a balance between the supply through implantation and the removal via desorption or sputtering [40]. In view of this, an interesting set of experiments was performed by Beshenkov et al [41]. In this work, the momentum of noble gas atoms emitted during sputtering was indirectly measured.…”

Section: Discussionmentioning

confidence: 99%

Anomalous effects in the aluminum oxide sputtering yield

Schelfhout¹,

Strijckmans²,

Depla³

2018

J. Phys. D: Appl. Phys.

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The sputtering yield of aluminum oxide during reactive magnetron sputtering has been quantified by a new and fast method. The method is based on the meticulous determination of the reactive gas consumption during reactive DC magnetron sputtering and has been deployed to determine the sputtering yield of aluminum oxide. The accuracy of the proposed method is demonstrated by comparing its results to the common weight loss method excluding secondary effects such as redeposition. Both methods exhibit a decrease in sputtering yield with increasing discharge current. This feature of the aluminum oxide sputtering yield is described for the first time. It resembles the discrepancy between published high sputtering yield values determined by low current ion beams and the low deposition rate in the poisoned mode during reactive magnetron sputtering. Moreover, the usefulness of the new method arises from its time-resolved capabilities. The evolution of the alumina sputtering yield can now be measured up to a resolution of seconds. This reveals the complex dynamical behavior of the sputtering yield. A plausible explanation of the observed anomalies seems to originate from the balance between retention and out-diffusion of implanted gas atoms, while other possible causes are commented.

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Section: Discussionmentioning

confidence: 99%

Anomalous effects in the aluminum oxide sputtering yield

Schelfhout¹,

Strijckmans²,

Depla³

2018

J. Phys. D: Appl. Phys.

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Noble gas retention in the target during rotating cylindrical magnetron sputtering

Mahieu

Leroy

Depla

et al. 2008

Applied Physics Letters

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A rotating cylindrical magnetron with a Ti target was sputtered in pure Xe or in a mixture of Xe and N2. The atomic composition of the target surface during sputtering has been investigated by in situ Rutherford backscattering spectrometry. The noble gas atomic ratio at the target surface is around 3.4% or 9.8% for sputtering in pure Xe and with 10% N2 addition, respectively. Energy resolved mass spectrometry reveals that some of the implanted Xe atoms are sputtered from the target. A radiation enhanced diffusion/detrapping/sputtering mechanism is proposed to model the flux of noble gas leaving the target during sputtering.

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