2014 IEEE International Electron Devices Meeting 2014
DOI: 10.1109/iedm.2014.7047120
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Monolithic 3D integration of logic and memory: Carbon nanotube FETs, resistive RAM, and silicon FETs

Abstract: We demonstrate monolithic 3D integration of logic and memory in arbitrary vertical stacking order with the ability to use conventional inter-layer vias to connect between any layers of the 3D IC. We experimentally show 4 vertically-stacked layers (logic layer followed by two memory layers followed by another logic layer), enabled by the integration of traditional silicon-FETs (on the bottom-most layer) with low-processing-temperature emerging nanotechnologies: metal-oxide resistive random-access memory (RRAM),… Show more

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Cited by 131 publications
(43 citation statements)
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“…The yield of PMOS devices was not enough to demonstrate the functionality of a working three-layer 3-D FPGA, but individual functional devices were obtained at each layer. More recently, in 2014, Shulaker et al [87] built a 1T-2R-based switch element for FPGAs, with a CNFET as the selection transistor and RRAM devices for the programmable resistors. The component devices of the switch element were realized on different layers.…”
Section: B Implementationsmentioning
confidence: 99%
“…The yield of PMOS devices was not enough to demonstrate the functionality of a working three-layer 3-D FPGA, but individual functional devices were obtained at each layer. More recently, in 2014, Shulaker et al [87] built a 1T-2R-based switch element for FPGAs, with a CNFET as the selection transistor and RRAM devices for the programmable resistors. The component devices of the switch element were realized on different layers.…”
Section: B Implementationsmentioning
confidence: 99%
“…Today's mobile AP SOC with billions of transistors is as powerful as the mainframe server a few decades ago. As the CMOS semiconductor technology scaling slows down, we should be looking into new innovations in the 3D device fabrication [1] and package integration [2] to keep the Moore's law going.…”
Section: Introductionmentioning
confidence: 99%
“…Carbon nanotube field-effect transistors (CNFETs) naturally overcome this temperature barrier since all fabrication steps can be accomplished below 200°C. Systems that monolithically integrate RRAM and CNFETs (on top of silicon transistors) have already been experimentally demonstrated [Shulaker14].…”
Section: D Integrationmentioning
confidence: 99%