2018
DOI: 10.1049/iet-pel.2017.0397
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Monolithically integrated power circuits in high‐voltage GaN‐on‐Si heterojunction technology

Abstract: This study presents monolithically integrated power circuits, fabricated in a high-voltage GaN-on-Si heterojunction technology. Different advanced concepts are presented and compared with solutions found in the literature. High switching transition slew rates are demonstrated by means of a monolithic power circuit with integrated gate driver. A highly linear temperature sensor is integrated in a GaN-high-electron-mobility transistor (HEMT) power device for the 600 V class and onstate resistance of 53 mΩ. An ar… Show more

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Cited by 40 publications
(21 citation statements)
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References 42 publications
(53 reference statements)
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“…Fraunhofer IAF has realized an integrated half-bridge converter as shown in Fig. 18, which can be switched at 3 MHz with a input/output of 400/200 V, and a current 1.15 A [92], [93]. In the aspects of GaN integration in companies, Navitas and Dialog have lunched the GaN power IC products.…”
Section: ) Normally-off Hemt Technologymentioning
confidence: 99%
“…Fraunhofer IAF has realized an integrated half-bridge converter as shown in Fig. 18, which can be switched at 3 MHz with a input/output of 400/200 V, and a current 1.15 A [92], [93]. In the aspects of GaN integration in companies, Navitas and Dialog have lunched the GaN power IC products.…”
Section: ) Normally-off Hemt Technologymentioning
confidence: 99%
“…A carbon‐codoped GaN buffer is employed for mismatch‐compensation and buffer isolation. Growth conditions of the buffer are chosen such that both a highly‐insulating buffer as well as a low trap‐density near the active region are achieved . The grown structures consist of an AlN‐nucleation layer, the 1.8 μm‐thick GaN buffer, an Al x Ga 1− x N barrier layer with a content x of 22% Aluminum, and again a thin GaN cap.…”
Section: Intended Comparisonmentioning
confidence: 99%
“…Growth conditions of the buffer are chosen such that both a highly-insulating buffer as well as a low trapdensity near the active region are achieved. [2] The grown structures consist of an AlN-nucleation layer, the 1.8 μm-thick GaN buffer, an Al x Ga 1Àx N barrier layer with a content x of 22% Aluminum, and again a thin GaN cap. For both growth options multiple wafers are grown and forwarded to wafer processing.…”
Section: Growth On Silicon Carbide and Silicon Substratementioning
confidence: 99%
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“…The subsequent reduction in device size in combination with the lateral nature of GaN power HEMTs enable monolithic integration of multiple components into compact power ICs with considerably lower parasitic inductance [6], thus allowing much higher frequency operation as well as high power density. These advances open doors to a future where a complete high power converter can be integrated on a single chip [7], [8], by following the same path that logic ICs have taken over the last six decades. However, such converters require orders of magnitude higher currents compared to logic ICs.…”
Section: Introductionmentioning
confidence: 99%