Multilayer x-ray optics with enhanced thermal and radiation stability

Fedorenko, A. I.; Кондратенко, В. В.; Bugaev, E. A.; Pershin, Yurii P.; Ponomarenko, A. G.; Poltseva, O. V.; Kopylets, I. А.; Yulin, Sergiy; Zubarev, E. N.

doi:10.1117/12.212589

Cited by 8 publications

(12 citation statements)

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“…14,[30][31][32][33] Neither TEM imaging is effective in reliable identification of mixed zones of the cobalt and carbon 14 in contrast to, for example, mixed zones of Mo/Si and Sc/Si structures which usually form crystalline metal layers. 34,35 However, there are other experimental methods which can be used for investigation of interlayer interactions of short-period Co/C multilayer structures. Chernov et al 36,37 successfully used EXAFS spectroscopy to study thin cobalt layers with the thickness 1.2 nm.…”

Section: Structural Characteristics Of Short-period Co/c Multilayer Mmentioning

confidence: 99%

Short-Period Multilayer X-ray Mirrors for “Water” and “Carbon Windows” Wavelengths

Kopylets

Devizenko

Zubarev

et al. 2019

j nanosci nanotechnol

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This review paper summarizes and provides an overview of our recent studies related to two types of short-period multilayer X-ray mirrors, W/B 4 C and Co/C. It deals with the experimental observation of the layer intermixing effects and how they affect the X-ray mirror's optical performance. The paper presents also some examples of using the fabricated X-ray mirrors in focusing and imaging experiments at the working wavelengths 2.48 nm and 4.47 nm.

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Section: Structural Characteristics Of Short-period Co/c Multilayer Mmentioning

confidence: 99%

Short-Period Multilayer X-ray Mirrors for “Water” and “Carbon Windows” Wavelengths

Kopylets

Devizenko

Zubarev

et al. 2019

j nanosci nanotechnol

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“…In these structures the crystalline Sc layers were always separated from the amorphous Si layers by ϳ3 nm of amorphous ScSi interface layers formed by interdiffusion. 8 The experimental setup used to irradiate the samples was described in Ref. 9.…”

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confidence: 99%

Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 469-nm laser pulses

et al. 2004

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The damage threshold and damage mechanism of extreme-ultraviolet Sc͞Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold f luences of ϳ0.08 J͞cm 2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-f lux extreme-ultraviolet sources in applications. However, the damage to these mirrors when exposed to high peak powers of EUV light has not been studied to our knowledge. This problem is now of particular relevance because the peak power and f luence of EUV sources have recently increased significantly (for example, the radiation f luence at the exit of a capillary-discharge Ne-like Ar laser operating at 46.9 nm can exceed 1 J͞cm 2 ) and is soon expected to achieve unprecedented values with the commissioning of EUV free-electron lasers. 2 -4 In this Letter we report results of the study of the optical damage mechanisms and the damage threshold for Sc͞Si EUV mirrors exposed to high-power EUV laser radiation. The study was conducted by focusing the output of a tabletop capillary-discharge Ne-like Ar laser emitting nanosecond duration pulses at a wavelength of 46.9 nm. The resulting damage to the multilayer coatings exposed to the EUV beam was analyzed with scanning electron microscopy (SEM), transmission electron microscopy (TEM), and small-angle x-ray diffraction (l 0.154 nm) techniques. Our results show that multilayer coatings on Si and borosilicate glass have similar damage threshold values of ϳ0.08 J͞cm 2 , compared with the 0.7 J͞cm 2 found necessary to damage a bare Si substrate. These values are similar to the thresholds found in Mo͞Si, W͞C, and W͞Si coatings measured at much shorter wavelengths. 6,7The Sc͞Si multilayers were deposited by dc magnetron sputtering at 3 mTorr of Ar pressure on superpolished borosilicate glass (surface roughness of s ϳ 0.4 nm) and on Si wafers (s ϳ 0.6 nm). The multilayers on borosilicate glass consisted of ten periods of Sc͞Si layers, each with a thickness of ϳ26.7 nm and a ratio of layer thickness of H͑Sc͒͞H͑Si͒ ϳ 0.7. A top 5-nm-thick Si protection layer capped the multilayers. The multilayer coatings deposited on Si consisted of 33 periods of Sc͞Si pairs with the same parameters as those deposited on borosilicate glass. In these structures the crystalline Sc layers were always separated from the amorphous Si layers by ϳ3 nm of amorphous ScSi interface layers formed by interdiffusion. The experimental setup used to irradiate the samples was described in Ref. 9. The laser emission was focused onto the target surface with a spherical R 10 cm Sc͞Si multilayer-coated mirror that was 2.5 cm in diameter and positioned at normal incidence. The ref lectivity of this particular mirror was measured to be ϳ30% at 46.9 nm. The capillarydischar...

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“…The multilayer coatings deposited on Si consisted of 33 periods of Sc/Si pairs with the same parameters as the borosilicate glass ones. In these structures the crystalline Sc layers are always separated from the amorphous Si layers by ~ 3 nm of amorphous ScSi interface layers formed by interdiffusion [22]. Fig.…”

Section: (B)mentioning

confidence: 99%

Recent results in capillary discharge soft x-ray laser research

Rocca¹,

Marconi²,

Wang³

et al. 2003

SPIE Proceedings

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We report results of the development of capillary discharge driven metal-vapor plasma waveguides for the development of efficient laser-pumped soft x-ray lasers; and of the use of a previously developed capillary discharge Nelike Ar 46.9 nm laser in study of the interaction of intense soft x-ray laser with materials. The guiding of a laser beam in a dense capillary discharge plasma channel containing a large density of Ag ions is reported. In term of applications we have conducted studies of materials modification and ablation with focalized 46.9 nm laser radiation at fluences between 0.1 and 100 J cm -2 . The experiments demonstrated that the combined high repetition rate and high energy per pulse of the capillary discharge laser allows for the first time the processing of large surface areas with intense soft x-ray laser radiation. The damage threshold and damage mechanism of extreme ultraviolet Sc/Si multilayer mirror coatings was studied . Damage threshold fluences of ~ 0.08 J/cm 2 were determined for coatings deposited on both borosilicate glass and Si substrates. Scanning and transmission electron microscopy, and small-angle X-ray diffraction techniques revealed the thermal nature of the damage mechanism. These results provide a benchmark for the use of Sc/Si multilayer mirrors in high fluence applications, and for the development of higher damage threshold mirrors. Soft x -ray laser ablation studies were also conducted for silicon and several plastic materials, including PMMA, Polyamide and PTFE.

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Multilayer x-ray optics with enhanced thermal and radiation stability

Cited by 8 publications

References 0 publications

Short-Period Multilayer X-ray Mirrors for “Water” and “Carbon Windows” Wavelengths

Short-Period Multilayer X-ray Mirrors for “Water” and “Carbon Windows” Wavelengths

Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 469-nm laser pulses

Recent results in capillary discharge soft x-ray laser research

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