Thermal stability of structure, period and X-ray reflectivity of multilayer mirrors for the whole range of soft X-rays with wavelengths 1-30 nm was studied in wide temperature range 350-1400 K by X-ray scattering and cross-sectional electron microscopy methods. Irradiation by He particles with energy 30 keV and doses 1x1019-4x102° ion/rn2 and by 10 MeVelectrons with dose up to 1O Gray was carried out for evaluation of radiation stability of Mo/Si and MoSi2/Si multilayer mirrors. It was shown that thermodynamic equilibrium of layer materials at their interfaces and stabilization of layer structure by impurities and heat treatment are effective approach to multilayer X-ray optics with enhanced thermal and radiation stability.In addition the multilayers have to meet the requirements to optical constants of layers and low roughness of interfaces to provide high reflectivity at the X-ray wavelength of interest. High smoothness of multilayer interfaces can be reached in case of very homogeneous structure of layers which is provided by two extremes of wide range of structural states of thin films: single-crystal and amorphous2. Unfortunately the specific requirements of epitaxial growth to single-crystal superlattices can be satisfied only in limited cases of deposition of multilayer X-ray optics.3 Polycrystal and amorphous layers are used in the main in the multilayer X-ray optics production. Therefore the study of ways to more stable multilayers of polycrystal and amorphous materials is inevitable.This report presents the results of studies performed at Department of Metal and Semiconductor Physics of Kharkiv State Polytechnic University to reach better understanding of possibilities for development of multilayer X-ray optics with enhanced 204

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