2006
DOI: 10.1143/jjap.45.5545
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Nano-Ablation of Inorganic Materials Using Laser Plasma Soft X-rays at around 10 nm

Abstract: We have investigated the direct nanomachining of inorganic materials using laser plasma soft X-rays (LPSXs). LPSXs were generated by the irradiation of Ta targets with Q-switched 532 nm Nd:YAG laser light at an energy density of ∼104 J/cm2. Under this condition, Ta plasma emits soft X-rays at around 10 nm. The LPSXs were focused on the surfaces of inorganic materials, using an ellipsoidal mirror that we desined so as to focus LPSXs at around 10 nm efficiently. We found that synthetic quartz glass, fused silica… Show more

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Cited by 6 publications
(2 citation statements)
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“…It has been proved in the early 2000s that high-quality nanometric pattern can be achieved on inorganic crystals via EUV direct writing with mask (figure 11). There is a linear relation between the shot number and ablation depth (0-2 µm), and machined surface roughness can reach 10 nm [101]. Monitor of the dynamic process by the pump-probe technique [102] reveals a rapid increase in the reflectivity of Si under 32.5 nm, 25 fs pulses.…”
Section: Short Wavelengthmentioning
confidence: 99%
“…It has been proved in the early 2000s that high-quality nanometric pattern can be achieved on inorganic crystals via EUV direct writing with mask (figure 11). There is a linear relation between the shot number and ablation depth (0-2 µm), and machined surface roughness can reach 10 nm [101]. Monitor of the dynamic process by the pump-probe technique [102] reveals a rapid increase in the reflectivity of Si under 32.5 nm, 25 fs pulses.…”
Section: Short Wavelengthmentioning
confidence: 99%
“…The solid to liquid changes lead to lattice disturbance and growth of structures on the surface of the irradiated material which changes the surface properties. Therefore laser-produced X-rays are a very efficient source for nano-machining (18)(19)(20).…”
Section: Introductionmentioning
confidence: 99%