2008
DOI: 10.1143/apex.1.057001
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Nano- and Microdot Array Formation of FeSi2by Nanosecond Excimer Laser-Induced Forward Transfer

Abstract: Fabrication of FeSi 2 nano-and microdot array was performed by utilizing droplet ejection through nanosecond laser-induced forward transfer (ns-LIFT). An amorphous FeSi 2 source film on a transparent support was illuminated from the support by a nanosecond excimer laser pulse patterned into migcrogrid form, resulting in size-and site-controlled deposition of microdot array onto a silicon substrate. Micro-Raman spectroscopy confirmed -FeSi 2 crystalline phase even on unheated substrates. Moreover, the dot size … Show more

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Cited by 47 publications
(33 citation statements)
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“…In a variation of the basic process, polycrystalline silicon films can be deposited using a hydrogen-assisted LIFT technique [34]. More recent examples include transfers of TiO 2 -Au nanocomposite films [35], carbon nanotubes for field emitter applications [36,37], conducting polymers such as poly(3,4-ethylenedioxythiophene) (PEDOT) [38], and semiconducting beta-FeSi 2 crystalline phases [39]. Repetitive transfers from the donor substrate over the same area can be used to increase the thickness of the transferred film on the acceptor substrate.…”
Section: 2 Simple Diagram Showing the Basic Elements Comprising A Lamentioning
confidence: 99%
“…In a variation of the basic process, polycrystalline silicon films can be deposited using a hydrogen-assisted LIFT technique [34]. More recent examples include transfers of TiO 2 -Au nanocomposite films [35], carbon nanotubes for field emitter applications [36,37], conducting polymers such as poly(3,4-ethylenedioxythiophene) (PEDOT) [38], and semiconducting beta-FeSi 2 crystalline phases [39]. Repetitive transfers from the donor substrate over the same area can be used to increase the thickness of the transferred film on the acceptor substrate.…”
Section: 2 Simple Diagram Showing the Basic Elements Comprising A Lamentioning
confidence: 99%
“…In a variation to the basic process, polycrystalline silicon films can be deposited using a hydrogen assisted LIFT technique (Toet et al, 1999). More recent examples include transfers of TiO 2 -Au nanocomposite films (Sakata et al, 2005), carbon nanotubes for field emitter applications (Chang-Jian et al, 2006;Cheng et al, 2007), conducting polymers such as Poly(3,4-ethylenedioxythiophene) (PEDOT) (Thomas et al, 2007) and semiconducting β-FeSi 2 crystalline phases (Narazaki et al, 2008). Repetitive transfers from the ribbon over the same area can be used to increase the thickness of the transferred film on the acceptor substrate.…”
Section: Understanding the Laser Transfer Processmentioning
confidence: 99%
“…For example, deposition of submicron gold droplets on substrate can be applied for additive fabrication, which requires gold material as receiver to improve the adhesion of droplets 6 . Until now, most studies about LIFT technique have focused on extending the range of materials [8][9][10][11] that able to be deposited using LIFT and focused on fabricating plasmonic devices by LIFT 5,[12][13][14] . Until now, most studies about LIFT technique have focused on extending the range of materials [8][9][10][11] that able to be deposited using LIFT and focused on fabricating plasmonic devices by LIFT 5,[12][13][14] .…”
Section: Introductionmentioning
confidence: 99%