“…In a variation to the basic process, polycrystalline silicon films can be deposited using a hydrogen assisted LIFT technique (Toet et al, 1999). More recent examples include transfers of TiO 2 -Au nanocomposite films (Sakata et al, 2005), carbon nanotubes for field emitter applications (Chang-Jian et al, 2006;Cheng et al, 2007), conducting polymers such as Poly(3,4-ethylenedioxythiophene) (PEDOT) (Thomas et al, 2007) and semiconducting β-FeSi 2 crystalline phases (Narazaki et al, 2008). Repetitive transfers from the ribbon over the same area can be used to increase the thickness of the transferred film on the acceptor substrate.…”