Fabrication of FeSi 2 nano-and microdot array was performed by utilizing droplet ejection through nanosecond laser-induced forward transfer (ns-LIFT). An amorphous FeSi 2 source film on a transparent support was illuminated from the support by a nanosecond excimer laser pulse patterned into migcrogrid form, resulting in size-and site-controlled deposition of microdot array onto a silicon substrate. Micro-Raman spectroscopy confirmed -FeSi 2 crystalline phase even on unheated substrates. Moreover, the dot size was successfully reduced to approximately 500 nm in diameter, smaller than any previously reported by ns-LIFT. This technique is useful for integrating functional nano-and microdots under atmospheric room-temperature conditions. #

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We have successfully fabricated a deep micro-trench about 7 µm wide and 420 µm deep on silica glass with a maximum aspect ratio of 60 by laser induced backside wet etching (LIBWE) via KrF laser ablation of a saturated pyrene/acetone solution. The processing time for the microetching was as short as 5 min at a repetition rate of 80 Hz and a fluence of F = 1.0 J·cm-2·pulse-1. The etch rate was calculated to be approximately 17 nm·pulse-1. The LIBWE method is shown to be very useful for surface microstructuring of silica glass with high aspect ratio and high throughput.

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