We describe how plasma-wall interactions in etching plasmas lead to either random roughening / nanotexturing of polymeric and Silicon surfaces, or formation of organized nanostructures on such surfaces. We conduct carefully designed experiments of plasma-wall interactions to understand the causes of both phenomena, and present Monte-Carlo simulation results confirming the experiments. We discuss emerging applications in wetting and optical property control, protein adsorption, microfluidics and lab-on-a-chip fabrication and modification, and cost-effective silicon mold fabrication. We conclude with an outlook on the plasma reactor future designs to take advantage of the observed phenomena for new micro and nanomanufacturing processes.