2006
DOI: 10.1021/nl052371p
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Nanolithography Using High Transmission Nanoscale Bowtie Apertures

Abstract: We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in photoresist by illuminating the apertures with a 355 nm laser beam polarized in the direction across the gap. Experimental results show enhanced transmission and light concentration of bowtie apertures compared to … Show more

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Cited by 234 publications
(157 citation statements)
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“…The strong field enhancement of dipole antennas has readily been shown by white light continuum generation [12]. Bowtie antennas have recently been used as near-field probes and for nanolithography [35,36]. The potential of both structures for the enhancement of the fluorescence of molecules has also been demonstrated [37][38][39].…”
Section: Introductionmentioning
confidence: 99%
“…The strong field enhancement of dipole antennas has readily been shown by white light continuum generation [12]. Bowtie antennas have recently been used as near-field probes and for nanolithography [35,36]. The potential of both structures for the enhancement of the fluorescence of molecules has also been demonstrated [37][38][39].…”
Section: Introductionmentioning
confidence: 99%
“…When integrated with flexible dielectric substrates, GNR can also overcome the proneness of micro-cracks in metallic thin films for conformal antennas. For example, a conformal microstrip patch consisting of two parallel electric conductors separated by a dielectric material was proposed in [17], fabricated by thin film deposition and nanolithography techniques [18]. Besides solving the mismatch problems in the THz regime [4], this basic topology is also widely used due to its miniaturization ability and conformality [10].…”
Section: Introductionmentioning
confidence: 99%
“…Among various types of nanofabrication methods, such as electron beam lithography, nanoimprint lithography [2], dip-pen lithography [3] and laser direct writing [4], near-field optical lithography using metallic nano-apertures or antennas is a promising technique due to its capacity of sub-diffraction resolution, cost effective, and possibility of parallel operation. In this type of lithography, sharp-ridged apertures in metal, such as bowtie, C-and H-shaped apertures and plasmonic lenses are important structures as the optical focusing element due to its capability of producing high confined light spots beyond the diffraction limit with enhanced intensity in the near-field region [5][6][7][8][9][10]. However, the transmitted light of the aperture is subjected to strong divergence.…”
Section: Introductionmentioning
confidence: 99%