Nanometer scale patterning of a monolayer Langmuir–Blodgett film with a scanning tunneling microscope in air

Day, H. C.; Allee, David R.; George, Robert D.; Burrows, Veronica

doi:10.1063/1.108608

Cited by 36 publications

(18 citation statements)

References 14 publications

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“…For example, spincoated polymer films and Langmuir-Blodgett films have been patterned using scanning tunneling microscopes (STMs) operated in vacuum [6 -8] as well as by using STMs or atomic force microscopes (AFMs) operated in air [9,10].…”

Section: *Present Address: Departmentmentioning

confidence: 99%

Organosilane Monolayer Resists for Scanning Probe Lithography.

Sugimura

Nakagiri

1997

J. Photopol. Sci. Technol.

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We report the preparation of organosilane monolayers by means of chemical vapor deposition and scanning probe lithography (SPL) using these monolayers as resists. Two types of monolayers having different alkyl groups, that is, trimethylsilyl [(CH3)3Si-, TMS] and octadecylsilyl [CH3(CH2)17Si=, ODS] monolayers, were deposited on Si substrate from precursor molecules of hexamethyldisilazane [(CH3)3Si-NH-Si(CH3)3,] and octadecyltrimethoxysilane [CH3(CH2)17Si(OCH3)3], respectively. The thicknesses of these monolayers as estimated by ellipsometry were 0.4 and 2.0 nm, respectively, and, therefore, were concluded to be defined by their alkyl chain lengths. Using an atomic force microscope (AFM) with an electrically conductive probe, a Si sample deposited with a TMS or ODS monolayer was patterned by flowing current through the AFM-probelsample junction. The pattern thus fabricated on the monolayer was transferred to the substrate Si by chemical etching in an aqueous solution of NH4F and H2O2. The etching proceeded area-selectively in the regions where the probe had passed, since, in these regions, the monolayer had been electrochemically degraded. The patterning was entirely accomplished through probe scanning without any need for further developing steps. The resist can thus be regarded as being self-developing. Both TMS and ODS successfully served as such SPL resists.

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Section: *Present Address: Departmentmentioning

confidence: 99%

Organosilane Monolayer Resists for Scanning Probe Lithography.

Sugimura

Nakagiri

1997

J. Photopol. Sci. Technol.

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“…Fluowet SB is regularly used as a spreading agent. [15] The complexation of PEI with Fluowet SB (stoichiometric complex with respect to charge) was performed in water by adding solutions of PEI to a dilute micellar solution of Fluowet SB. In contrast to the procedure described earlier, [12,13] macroscopic precipitation of the complex was avoided by using an excess of Fluowet SB to aid dispersion.…”

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confidence: 99%

The Culture of Mammalian Cells on Nanostructured Silicon

et al. 1999

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RSiCl 3 : Freshly prepared wafers were placed into a solution of the appropriate trichlorosilane (5 mM) in freshly distilled toluene for 2 h. Upon removal from the toluene solution, the wafers were rinsed with chloroform and absolute ethanol. The wafers were then baked on a hot plate at 120 C for 2 min.Monolayer Characterization: Contact angles were determined on a Krüss Model G10 goniometer at room temperature and ambient relative humidity using the sessile drop method [21]. Monolayer thickness was determined using a Gaertner L116A ellipsometer equipped with a 632.8 nm He-Ne laser. Monolayer thicknesses were determined assuming n f = 1.5, and with the incident and reflected light making a 70 C angle to the surface normal. Data presented are averages of at least ten different measurements on three different areas of the wafer. Film roughness was determined in contact mode AFM and calculated using PSI ProScan software.

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“…These results are consistent with our former work on the stearic acid-Au system where the material buildup under the tip was confirmed to be carbon by Auger electron spectroscopy. 1 This process appears to be very similar to the buildup of lines of contamination in vacuum in the presence of a focused electron beam 13 where the resulting high-molecular-weight hydrocarbon is insoluble in most solvents. It was also found that the average linewidth of these carbon patterns decreased as the tunneling current decreased.…”

Section: Resultsmentioning

confidence: 90%

“…[1][2][3][4] The advantage of the LB technique is that organic monolayers can be formed on most substrates. Sub-100-nm lines have been written in a trilayer of decosenoic acid ͑film thickness 10 nm͒ using a high-vacuum scanning tunneling microscope ͑STM͒ for exposure.…”

Section: Introductionmentioning

confidence: 99%

“…6 Previously in our laboratory, ambient STM lithography has been used to pattern 25 nm lines in a submonolayer of a stearic acid LB film. 1 However, LB films formed from amphophilic monomers have relatively poor thermal and mechanical stability which make them undesirable as resists. Polymethylmethacrylate ͑PMMA͒, on the other hand, is a wellcharacterized polymer having been used as a high-resolution resist in electron beam lithography for many years.…”

Section: Introductionmentioning

confidence: 99%

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Ambient scanning tunneling lithography of Langmuir–Blodgett and self-assembled monolayers

Xu¹,

Allee²

1995

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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Ultrathin resist films have been prepared by both Langmuir-Blodgett ͑LB͒ and self-assembly ͑SA͒ techniques. The LB films include both monomer films ͑stearic alcohol͒ and polymer films ͑polymethyl-methacrylate͒. Nanometer scale patterning of these thin films have been performed on different substrates ͑GaAs, Au, and Pt͒ by using the scanning tunneling microscope ͑STM͒ as the exposing tool. Both carbon deposit buildup and chain breakdown underneath the STM tip are observed. The STM-generated patterns are transferred into metal films and semiconductor substrates by chemical etching. Using an atomic force microscope for imaging, lines with 25 nm width have been observed.

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Nanometer scale patterning of a monolayer Langmuir–Blodgett film with a scanning tunneling microscope in air

Cited by 36 publications

References 14 publications

Organosilane Monolayer Resists for Scanning Probe Lithography.

Organosilane Monolayer Resists for Scanning Probe Lithography.

The Culture of Mammalian Cells on Nanostructured Silicon

Ambient scanning tunneling lithography of Langmuir–Blodgett and self-assembled monolayers

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