Nanoparticles in SiH4-Ar plasma: Modelling and comparison with experimental data

Gordiet︠s︡, B. F.; Inestrosa-Izurieta, M. J.; Navarro, A; Bertran, Enric

doi:10.1063/1.3658249

Cited by 7 publications

(4 citation statements)

References 36 publications

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“…Such nanosynthesis is selective because the system does not proceed beyond the breakdown phase and, therefore, the coagulation in bigger clusters is hindered. In a different application concerning controlled production of particles [37,38], pulsed arc signals could be tailored to grow carbon nanostructures with a determined size distribution. Thus, pulsed anodic arc discharge technique is promising for the synthesis of monodisperse ensembles of nanoparticles with accurate control of the particle size.…”

Section: Pulsed Versus DC Anodic Arc Dischargesmentioning

confidence: 99%

Pulsed anodic arc discharge for the synthesis of carbon nanomaterials

Corbella

Portal

Zolotukhin

et al. 2019

Plasma Sources Sci. Technol.

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Pulsed arc discharges can improve arc control and tailor the ablation process in the production of 1D and 2D nanostructures from carbon anodes. In this work, low-dimensional carbon nanoparticles have been generated by means of anodic arc discharge in helium atmosphere excited with a square-wave modulated signal (1-5 Hz, 10% duty cycle). The discharges were performed between two graphite electrodes with maximal peak current of 250 A and maximal voltage of 65 V. The erosion rates and conversion efficiency of the ablated anode are compared to reference samples grown in DC steady arc mode. Ablation rates in pulsed arcs are typically of the order of 1 mg s −1 . Combination of fast Langmuir probe diagnostics and optical emission spectroscopy provided plasma parameters of the discharges at the arc column. Ranges of 10 16 -10 17 m −3 for electron density and 0.5-2.0 eV for electron temperature are estimated. The obtained samples were characterized with Raman spectroscopy and scanning electron microscopy. The deposit on the cathode after pulsed arc consisted of carbon nanostructures such as graphene nano-platelets and carbon nanotubes. Erosion dynamics of pulsed arc discharge has been described in terms of a global model and compared to steady arc discharge. A correlation is identified among discharge regimes, optical emission patterns and ablation modes. In conclusion, pulsed anodic arc discharge is a very efficient source of carbon nanomaterials. The large control of the discharge characteristics will permit to tailor accurately the production and the properties of carbon nanotubes and graphene. This deposition method is promising for the fabrication of semiconducting nanomaterials with tuneable electrical and optical properties.

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Section: Pulsed Versus DC Anodic Arc Dischargesmentioning

confidence: 99%

Pulsed anodic arc discharge for the synthesis of carbon nanomaterials

Corbella

Portal

Zolotukhin

et al. 2019

Plasma Sources Sci. Technol.

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“…Thinner carbon deposition on cathode was observed probably due to the neutral nanoparticles and negative radicals of carbon. Moreover, the cathode suffers a significant ion bombardment (e.g., CH 3 + [54]). In addition, according to the given growth mechanism of CEINPs, the nitrogen plasma has higher temperature compared to helium plasma, which results in higher availability of carbon species.…”

Section: Resultsmentioning

confidence: 99%

Synthesis of Carbon Encapsulated Mono‐ and Multi‐Iron Nanoparticles

Sanaee

Bertran

2015

Journal of Nanomaterials

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Core–shell nanostructures of carbon encapsulated iron nanoparticles (CEINPs) show unique properties and technological applications, because carbon shell provides extreme chemical stability and protects pure iron core against oxidation without impairing the possibility of functionalization of the carbon surface. Enhancing iron core magnetic properties and, in parallel, improving carbon shell sealing are the two major challenges in the synthesis of CEINPs. Here, we present the synthesis of both CEINPs and a new carbon encapsulated multi-iron nanoparticle by a new modified arc discharge reactor. The nanoparticle size, composition, and crystallinity and the magnetic properties have been studied. The morphological properties were observed by scanning electron microscopy and transmission electron microscopy. In order to evaluate carbon shell protection, the iron cores were characterized by selected area diffraction and fast Fourier transform techniques as well as by electron energy loss and energy dispersive X-ray spectroscopies. Afterward, the magnetic properties were investigated using a superconducting quantum interference device. As main results, spherical, oval, and multi-iron cores were controllably synthesized by this new modified arc discharge method. The carbon shell with high crystallinity exhibited sufficient protection against oxidation of pure iron cores. The presented results also provided new elements for understanding the growth mechanism of iron core and carbon shell.

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“…For example, some studies have attempted to establish the conditions that enable rapid deposition of an amorphous silicon layer [24][25][26]. In addition, various studies have concentrated on the generation of silicon nanoparticles [27][28][29][30]. However, it was difficult to find numerical research involving an in-depth analysis of the spatial distribution of the plasma parameters in SiH 4 /Ar CCPs.…”

Section: Introductionmentioning

confidence: 99%

Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors

Kim,

Lee,

Park

2024

Plasma Sources Sci. Technol.

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This paper presents the results of our numerical analysis to optimize the dielectric properties to achieve process uniformity in the thin film deposition process using capacitively coupled plasma. The difference in the plasma density distribution was analyzed by changing the wafer material from silicon to quartz (or Teflon). Similarly, aluminum was compared with aluminum nitride as the electrode material, and the sidewall material was varied from quartz to a perfect dielectric to study the effect on the plasma characteristics. A two-dimensional self-consistent fluid model was used to analyze the spatial distribution of the plasma parameters. In terms of the process conditions, the gas pressure was set to 400 Pa, the input power was fixed to 100 W, and a radio frequency of 13.56 MHz was used. SiH4/Ar was used as the gas mixture, and these conditions were used as input for numerical simulations of the deposition state of the hydrogenated amorphous silicon layer. The radial spatial distribution of plasma parameters was confirmed to be modified by dielectric elements with low dielectric constants regardless of the type of element. Despite the thin wafer thickness, the use of a wafer with low permittivity weakens the electric field near the electrode edge due to the stronger surface charge effect. Additionally, by changing the material of the sidewall to a perfect dielectric, a more uniform distribution of plasma could be obtained. This is achieved as the peak values of the plasma parameters are located away from the wafer edge. Interestingly, the case in which half of the sidewall was specified as comprising a perfect dielectric and the other half quartz had a more uniform distribution than the case in which the sidewalls consisted entirely of a perfect dielectric.

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Nanoparticles in SiH4-Ar plasma: Modelling and comparison with experimental data

Cited by 7 publications

References 36 publications

Pulsed anodic arc discharge for the synthesis of carbon nanomaterials

Pulsed anodic arc discharge for the synthesis of carbon nanomaterials

Synthesis of Carbon Encapsulated Mono‐ and Multi‐Iron Nanoparticles

Numerical optimization of dielectric properties to achieve process uniformity in capacitively coupled plasma reactors

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