Thin layers of a-Si3N4 were synthesized by the pyrolysis of thin films of poly(methylsilane)
(PMS) and poly(dimethylsilane) (PDMS) spin-coated on silicon single-crystal wafers and via
deposition of the volatile species resulting from the thermal cracking of the bulk precursor
in the presence of ammonia. The process was monitored by FT-IR spectroscopy. The reaction
between NH3 and PMS begins at 200 °C with the slow production of a slightly cross-linked
product involving Si3N knots. Extensive amination of PMS occurs on pyrolysis at 300 °C,
under 5−10 Torr NH3 overpressure. The product exhibits IR bands characteristic of both a
silazane and an aminosilane species, which are presumably formed by Si−H and N−H
heterodehydrocoupling. Between 200 and 450 °C, this cross dehydrocoupling reaction
competes very effectively with the Kumada rearrangement. Significant loss of carbon occurs
from the resulting poly(carbosilazane) between 500 and 600 °C. Prolonged curing under NH3
at 300 °C, to remove all Si−H groups and to give a densely cross-linked polysilazane,
suppresses the Kumada rearrangement, and negligible carbon loss occurs on raising the
pyrolysis temperature to 700 °C. Although the main product is still a-SI3N4, there is an
increased amount of residual carbon.