2017
DOI: 10.1016/j.mee.2017.02.023
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Nanostructuring methylammonium lead iodide perovskite by ultrafast nano imprinting lithography

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Cited by 15 publications
(13 citation statements)
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“…In addition to the silicon and PDMS molds, other molds, such as AAO templates, photolithography patterns assisted by photoresists, and a combination of rigid pillars with photoresists, have been investigated to fabricate patterned lead halide perovskite crystals. For example, Gu et al used AAO templates to fabricate 3D lead halide perovskite crystals by the so-called vapor–solid–solid reaction process, as shown in Figure a . The lead nanoclusters at the bottom of the AAO nanochannels were utilized as nucleation sites to initiate high-quality CH 3 NH 3 PbI 3 nanowire growth.…”
Section: Other Molds Used For the Fabrication Of Lead Halide Perovski...mentioning
confidence: 99%
See 1 more Smart Citation
“…In addition to the silicon and PDMS molds, other molds, such as AAO templates, photolithography patterns assisted by photoresists, and a combination of rigid pillars with photoresists, have been investigated to fabricate patterned lead halide perovskite crystals. For example, Gu et al used AAO templates to fabricate 3D lead halide perovskite crystals by the so-called vapor–solid–solid reaction process, as shown in Figure a . The lead nanoclusters at the bottom of the AAO nanochannels were utilized as nucleation sites to initiate high-quality CH 3 NH 3 PbI 3 nanowire growth.…”
Section: Other Molds Used For the Fabrication Of Lead Halide Perovski...mentioning
confidence: 99%
“…In addition to AAO templates, photolithography has also developed into a mature technology for the synthesis of patterned perovskite single crystals. For example, a microstructured photoresist prepared by photolithography has been used as a template in fabricating a patterned crystal film and has demonstrated a good kind of lasing action. A high- Q resonance can be found at around 541 nm, and the field pattern in the x – y plane showed that the field distribution was a TE mode in the z direction .…”
Section: Other Molds Used For the Fabrication Of Lead Halide Perovski...mentioning
confidence: 99%
“…The hybrid organic–inorganic halide perovskite CH 3 NH 3 PbI 3 (MAPbI) with an ABX 3 architecture has recently been demonstrated as a successful optical and optoelectronic material owing to its tunable direct band gap, long carrier lifetimes, high carrier mobilities, and diffusion lengths. In addition, the low cost and facile fabrication of MAPbI thin films in solution form are advantageous in terms of their large-scale industrial preparation. , The nanopatterning of perovskite thin films has been shown to improve the efficiency of solar cells through reduced surface reflectance, tailored light trapping, and higher external radiative efficiency and directionality. Researchers have demonstrated different techniques for the fabrication of perovskite metasurfaces ranging from etching of the substrate and subsequent conformal coating to direct patterning using focused ion beam milling. Soft polymer-based imprinting techniques are appropriate for halide perovskites due to their sensitivity to water and plasma processing present in conventional lithography and etching processes. This goal was achieved by employing nanoimprint lithography using an inflexible stamp (silicon, Si) as well as using more flexible polydimethylsiloxane (PDMS) stamps. Unlike an inflexible Si stamp, PDMS can imprint its textures conformally over nonuniform surfaces and defects . The process also proves to be cost-effective as multiple PDMS stamps could be recycled from a single master.…”
Section: Introductionmentioning
confidence: 99%
“…To this end, in our previous work, we have used nanoimprint lithography to pattern spin-coated perovskite films through heated and pressurized contact with inflexible stamp. [8] On the other hand, Mao et al [9] fabricated a directly patterned nanostructure of MHP deposited from solution using flexible polydimethylsiloxane (PDMS) stamps. Unlike a silicon stamp, the PDMS can imprint its textures conformally on non-uniform surfaces and over defects.…”
Section: Introductionmentioning
confidence: 99%