Patterned Lead Halide Perovskite Crystals Fabricated by Microstructured Templates

Abstract

Lead halide perovskite crystals have been widely used in solar cells, lasers, organic light-emitting diodes, piezoelectric sensors, etc. due to their high carrier mobility, large light absorption coefficients, and long carrier diffusion lengths. So far, much effort has been devoted to the fabrication of lead halide perovskite crystals by means of a solution process and physical methods. In some application domains, the lead halide perovskite crystals, as lasers or devices, for example, require a regular micropatterned structure in order to achieve arrays with almost identical optical or electronic modes. Concomitantly, patterned structures can further optimize the properties of perovskite crystals in their related optoeletronic devices. Therefore, how to fabricate micropatterned lead halide perovskite crystal is one of the hottest research topics in the past few years. Among various kinds of strategies, a combination of templates and wetting discrepancy has been demonstrated to be a simple but robust method, to obtain perovskite crystals with regular arrays and excellent properties. The common selected template materials are silicon, polydimethylsiloxane (PDMS), anodized aluminum oxide (AAO), and photoresist. This review provides insight into the fabrication of patterned lead halide perovskite crystals by using templates composed by the materials stated above and intelligently controlling wetting discrepancy. More importantly, we briefly discuss the key factors and challenges during the pattern process. Finally, the relationship among these templates is discussed, which will shed light on the low-cost fabrication of stable, high-quality perovskite crystals for new applications.

Oriented Halide Perovskite Nanostructures and Thin Films for Optoelectronics

“…The previously mentioned AAO template growth methods represent “infiltration” processes in which the perovskite precursors penetrate into the templates. However, researchers have also developed template growth methods based on an “imprinting” process, where the templates are stamped onto the halide perovskite precursors to mold the precise nanostructures or patterns . In general, imprint lithography and micromolding in capillaries (MIMIC) are the most commonly used imprinting methods for materials that can be obtained from solution-phase precursors …”

“…However, researchers have also developed template growth methods based on an "imprinting" process, where the templates are stamped onto the halide perovskite precursors to mold the precise nanostructures or patterns. 99 In general, imprint lithography and micromolding in capillaries (MIMIC) are the most commonly used imprinting methods for materials that can be obtained from solution-phase precursors. 100 Figure 9a shows a typical imprint and MIMIC process using a polydimethylsiloxane (PDMS) stamp as an example.…”

Shaping and enhancing the photoluminescence of halide perovskite quantum dots with plasmonic lattices

“…A possible solution is nanostructuring the emitting material to form metasurfaces and lattices that present enhanced absorption and photoluminescence. 5,17,18 Although viable, a more straightforward way of achieving directional emission is to couple the thin light-emitting layer to a nanostructure possessing an angular-dependent optical response. For instance, perovskite continuous films have been used as active material in distributed feedback and vertical-cavity surface-emitting lasers, 19,20 as well as in combination with photonic crystals.…”

Flexible Metal Halide Perovskite Photodetector Arrays via Photolithography and Dry Lift‐Off Patterning

“…[7][8][9][10] To achieve the integration of metal halide perovskites into electronic and optoelectronic devices, a microfabrication process flow including an efficient patterning method is required. [11][12][13] However, current approaches to achieve high-resolution perovskite patterns have shortcomings (Table 1). The most explored technique in manufacturing pixel arrays, thermal evaporation through a fine shadow mask, is costly due to the need for high-temperature and extreme vacuum conditions.…”