We show that a buried oxide layer forming a current aperture in an all epitaxial vertical-cavity surface emitting laser has a profound influence on the optical and electrical characteristics of the device. The lateral index variation formed around the oxide current aperture leads to a shift in the cavity resonance wavelength. The resonance wavelength under the oxide layer can thus be manipulated, independent of the as-grown cavity resonance, by adjusting the oxide layer thickness and its placement relative to the active region. In addition, the electrical confinement afforded by the oxide layer enables record low threshold current densities and threshold voltages in these lasers. © 1995 American Institute of Physics.Vertical-cavity surface emitting lasers ͑VCSELs͒ are of interest from both scientific and technological points of view. The distributed Bragg reflector ͑DBR͒ mirrors used to provide longitudinal optical confinement have enabled the study of microcavity optical phenomena and are critical to VCSEL performance. In the transverse direction, optical and electrical confinement is commonly achieved using etched air-post index-guided structures, 1 or ion implanted ''gain-guided'' devices. 2 Recently, oxides formed from AlGaAs layers have been implemented into both edge emitting 3 and verticalcavity laser diodes. 4 -7 We report optical and electrical properties of VCSELs fabricated using selective lateral oxidation to produce a buried oxide layer which forms a current aperture within an all semiconductor DBR mirror. We show that the buried oxide layer has profound implications, leading to new optical phenomena in the cavity as well as significant advances in VCSEL performance.The selectively oxidized VCSEL structure 6 is shown in Fig. 1. VCSEL diodes employing an oxide layer under a hybrid top dielectric DBR mirror have also been reported. 4,5 The VCSELs described herein are grown by metalorganic vapor phase epitaxy and employ three InGaAs quantum wells designed to emit near 980 nm with parabolically graded mirror interfaces in the epitaxial DBRs. 8 The high oxidation selectivity of AlGaAs alloys 6 is exploited to form a single buried oxide layer between the active region and the top DBR as depicted in Fig. 1. Square mesas are reactive ion etched to expose the edge of the quarter-wavelength thick AlGaAs layer for lateral oxidation done at 425-450°C in water vapor. The AlGaAs layer is partially oxidized laterally into the interior of the mesa to form a current aperture. The oxide current aperture thus minimizes current spreading and eliminates sidewall nonradiative recombination or implantation damage present in air-post or implanted structures, respectively. The smaller refractive index of the oxide layer 9 also induces index-guided optical confinement, but in a planar VCSEL configuration amenable to efficient current flow and heat extraction. Greater optical and electrical confinement is achieved by employing current aperture oxide layers on both sides of the active region. Finally contrary to other reports...